Detailed Information

Research Field/Keywords for Research Field

• Plasma Electronics, Plasma Processing, Sputtering, Functional ultra hydrophobic thin films, Transparent conductive oxide semiconductor thin films, Neutral Bean Injection, Negative ion production

Education

• 1989/03, Graduated
• 1991/03, Master Course, Completed

Employment Experience

• 1991/04 - 1997/03 Research Associate, Faculty of Science and Engineering, Saga University
• 1993/05 - 1994/02 Researcher for visiting Nagoya University
• 1997/04 - 2002/03 Lecturer, Faculty of Science and Engineering, Saga University
• 2002/04 - 2007/03 Associate Professor, Faculty of Science and Engineering, Saga University
• 2007/04 - 2010/03 Associate Professor, Electrical and Electronic Engineering, Faculty of Science and Engineering, Saga University
• 2010/04 - 2014/12 Associate Professor, Electrical and Electronic Engineering, Graduate School of Science and Engineering, Saga University
• 2015/01 - 2019/03 Professor, Electrical and Electronic Engineering , Graduate School of Science and Engineering, Saga University
• 2019/04 -  *  Professor, Saga University
• 2020/04 -  *  Professor, INSTITUTE OF OCEAN ENERGY, Saga University

Field of Specialization

• Plasma electronics, Plasma science

Membership in Academic Societies

• MRS-J

Awards

• AIP Publishing AIP Advnaces Vol.7, Issue 5, May 2017 "Editor's Picks" （2017/05）
• IOP Publishing 'Outstanding Reviewer' Award （2020/03）
• IOP trusted reviewer status （2020/09）
• Nature research Scientific reports October 2021 Reviewers （2021/10）
• IOP Trusted Reviewer Status （2022/09）
• AIP Publishing Journal of Vacuum Science and Technology A Vol.42, Issue 3, May/June 2024 "Featured Articles" （2024/05）

Themes for Ongoing Research

• Development of water repellent film preparation device with RF discharge
• Development of large diameter uniform high-density plasma device for thin film preparation and etching
• Deposition of hydrophobic films on polycarbonate plate by RF sputtering for next-generation vehicle window
• Low temperature deposition of AZO thin films by novel sputtering method
• Development of novel sputtering source for full utilization with extensive target　including rare metals
• Production of high-density negative hydrogen ion plasma　for neutral beam injection in nuclear fusion
• Development of high-desity hydrogen plasma by novel hollow cathode magnetized discharge

Research Topics and Results

• Effect of multi-cusp magnetic fields to generate a high-density hydrogen plasma inside a low pressure H_2 cylindrical hollow cathode discharge 2024/09
• Characteristics of a hybrid radio-frequency capacitively and inductively coupled plasma using hydrogen gas 2024/07
• Production of a high-density hydrogen plasma in a capacitively coupled RF discharge with a hollow cathode enclosed by magnets 2024/05
• 佐賀大学プラズマエレクトロニクス研究室の紹介 2023/12
• Design of rotational RF magnetron sputtering plasma and its characteristics for target utilization saving resources 2023/10
• Spatial distributions of the ion flux in a capacitive hydrogen RF discharge using a hollow cathode with double toroidal grooves enclosed by magnets 2023/06
• Spatial structures of rf ring-shaped magnetized sputtering plasmas with two facing cylindrical ZnO/Al2O3 targets 2023/04
• 佐賀大学理工学部電気電子工学部門プラズマエレクトロニクス研究室紹介 2022/12
• Spatial structures of rf ring-shaped magnetized sputtering plasma with two facing cylindrical ZnO/ Al2O3 targets 2022/11
• Characteristics of Novel Rotational Magnetron Sputtering Plasma Sources with Various Magnet Arrangements for Target Utilization Saving Resources 2022/10
• Temporal evolution of the ion flux to the target in rotational RF multi-magnetron plasma 2022/08
• Development of a cruciform radio-frequency closed magnetron sputtering source including four sectorial magnetron sputtering discharges for uniform target utilization 2022/08
• Spatial profile of Al-ZnO thin film on polycarbonate deposited by ring-shaped magnetized rf plasma sputtering with two facing cylindrical Al_2O_3 - ZnO targets 2022/04
• Properties of AZO thin films prepared by stationary and rotating RF magnetized plasma sputtering source 2022/01
• Preparation of water-repellent film on a plastic plate by unbalanced radio-frequency magnetron plasma sputtering using PTFE target for a next-generation automobile window 2021/10
• Characteristics of a radio frequency magnetized double-ring-shaped hollow cathode plasma source with permanent magnets for high-density hydrogen plasma generation 2021/08
• Development of rotational maze-shaped RF magnetron plasma for successful target utilization and the thin film preparation 2021/01
• Characteristics of a rotational windmill-shaped radio frequency magnetron sputtering plasma for effective target utilization 2020/11
• Production of double ring-shaped magnetized radio-frequency hydrogen high-density plasma 2019/11
• Development of Novel RF Sputtering Plasma Source and Preparation of Al-Doped ZnO Thin Films for Transparent Conductive Oxide Applications 2019/09
• Spatial structure of radio-frequency capacitive discharge plasma with ring-shaped hollow electrode using Ar and O2 mixture gases 2019/08
• Treatment of a polycarbonate plate for a next-generation vehicle window by radio frequency magnetron plasma sputtering using a PVDF target 2019/06
• Observation of ring–shaped pulsed DC discharge plasma source using single pole magnet setups for material processing 2019/06
• Outer Ring-Shaped Radio Frequency Magnetized Plasma Source for Target Utilization in Specific Area 2018/08
• Atmospheric-pressure plasma jet system for silicon etching without fluorocarbon gas feed 2018/01
• RF magnetized ring-shaped plasma for target utilization obtained with circular magnet monopole arrangement 2018/01
• プラズマ表面改質により作製した機能性超撥水性膜 2017/12
• Rotational cross-shaped magnetized radio-frequency sputtering plasma source for uniform circular target utilization 2017/11
• Performance of a Gyratory Square-Shaped Capacitive Radio Frequency Discharge Plasma Sputtering Source for Materials Processing 2017/09
• Spatial structure of radio frequency ring-shaped magnetized discharge sputtering plasma using two facing ZnO/Al2O3 cylindrical targets for Al-doped ZnO thin film preparation 2017/05
• Plasma characteristics and target erosion profile of racetrack-shaped RF magnetron plasma with weak rubber magnets for full circular target utilization 2016/11
• プラズマ処理装置 2016/11
• High-density radio-frequency magnetized plasma sputtering source with rotational square-shaped arrangement of rod magnets for uniform target utilization 2016/04
• Capacitive radio frequency discharges with a single ring-shaped narrow trench of various depths to enhance the plasma density and lateral uniformity 2016/03
• Sustaining mechanism and spatial structure of high-density ring-shaped hollow cuspate magnetized rf plasma for low-pressure plasma processing 2015/05
• Radio-frequency magnetized ring-shaped hollow cathode discharge plasma for low-pressure plasma processing 2014/03
• Production of High-Density Radio Frequency Plasma Source by Ring-Shaped Hollow-Cathode Discharge at Various Trench-Shapes 2013/08
• Production of High-Density RF Plasma Using Ring-Shaped Hollow Cathode for Material Processing 2013/06
• Criteria of radio-frequency ring-shaped hollow cathode discharge using H2 and Ar gases for plasma processing 2013/01
• High-density RF plasma by hollow cathode for plasma processing 2011/10
• Preparation of Water-Repellent Thin Film with Inductive Plasma using C2H2F2/Ar gases and Investigation of Its Adhesion by Positively Pulse-Biasing 2011/04
• Production of Dual Frequency Sputtering Plasma for Preparation of Aluminum Nitride Thin Films 2011/04
• Development of high-density radio frequency plasma source with a ring-shaped trench hollow electrode for dry processing 2010/08
• Influence of Xe Gas Concentration on Plasma Parameters and Luminance Characteristics in Fluorescent Lamps driven by an Inductively Coupled Radio Frequency Discharge Using Ne / Xe Mixture Gases 2010/06
• Preparation of Water-Repellent Films by Plasma-Coating and its Application 2010/01
• Production of capacitively coupled atmospheric plasma jet with multiring-electrodes for the medical plasma tool 2009/11
• Two-Dimensional Spatial Structure of Inductively Coupled Plasma with One Internal Loop Antenna 2009/10
• Production of high-density capacitively coupled plasma with RF multi-hollow cathode and/or high secondary electron emission for DLC film preparation 2009/10
• Preparation of Water-Repellent Thin Film with Inductive Plasma using C2H2F2/Ar gases and Investigation of Its Adhesion by Positively Pulse-Biasing 2009/09
• Improvement of a dual frequency sputtering device for higher deposition rates of protective zirconium oxide films on ceramics 2009/07
• Preparation of water-repellent thin film by RF pulse-modulated plasma CVD using C_2H_2F_2 gas 2008/09
• Production of high-density capacitive plasma by the effects of multi-hollow cathode discharge and high-secondary-electron-emissio 2008/04
• 第５章　薄膜製造における最近のトピックス、第１節「スハ゜ッタリンク゛におけるハ゜ーティクル発生機構とその抑制」 2007
• Spatial Behavior of the Plasma Potential in a Magnetized Radio-Frequency Discharge from Emissive Probe Data 2007
• Ultra-Water Repellency of Films Prepared by Capacitively Coupled C2H2F2/Ar Discharge Plasma 2007
• Effect of negative pulsed high-voltage-bias on diamond-like carbon thin film preparation using capacitively coupled radio frequency plasma chemical vapor deposition 2007
• Influence of ion-bombardment-energy on thin zirconium oxide films prepared by dual frequency oxygen plasma sputtering 2007
• Ar/O2 gas pressure dependences of a pulsed zirconium arc and extracted ion characteristics 2007
• Preparation of water-repellent film by RF plasma CVD using C2H2F2 gas 2007
• Current-free double-layer formation in inductively coupled plasma in a uniform magnetic field 2006
• Influences of oxide material on high density plasma production using capacitively coupled discharge 2006
• Ar/O2 gas pressure dependence of atomic concentration of zirconia prepared by zirconium pulse arc PBII& D 2006
• Preparation of zirconium oxide thin film using inductively coupled oxygen plasma sputtering 2005
• Energy Distribution of Ions Incident onto a Dc-Biased Substrate in Electron Cyclotron Resonance Sputtering Plasma for SrTiO~3 Thin Film Preparation 2004
• Influences of gap distance on plasma characteristics in narrow gap capacitively coupled radio-frequency discharge 2004
• Measurement of ion temperature in magnetized inductively coupled plasma with external helical antenna 2004
• Production of high-density capacitively coupled radio-frequency discharge plasma by high-secondary-electron-emission oxide 2004
• Optimization of oxide material electrode for high-density plasma production in capacitively coupled RF discharge 2004
• Time-Averaged Energy Distribution Function of Ions Impacted on an RF-biased Substrate in Electron Cyclotron Resonance Microwave Plasma 2003
• Annular profile of dust density near RF powered electrode in a capacitively coupled plasma 2002/04

Books

• Characteristics of Novel Rotational Magnetron Sputtering Plasma Sources with Various Magnet Arrangements for Target Utilization Saving Resources;　2022/10
  ANNOUNCEMENT INFO.;　Advances in Materials Science Research, edited by M.C. Wythers, Nova Science Publishers, New York, 2022, 56, Chapter 5, 243-272
  AUTHOR;　Y.Ohtsu, M. Amzad Hossain and J. Schulze
  
• 第２章　第5節　 スパッタ法による超撥水性薄膜合成と最新の研究動向;　2021/03
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Development of Novel RF Sputtering Plasma Source and Preparation of Al-Doped ZnO Thin Films for Transparent Conductive Oxide Applications;　2019/09
  ANNOUNCEMENT INFO.;　ZnO Thin Films: Properties, Performance and Applications, Chapter 6, NOVA Science Publishers, editor Paolo Mele, 193-208
  AUTHOR;　Yasunori Ohtsu and Takashi Sumiyama
  
• Physics of High-Density Radio Frequency Capacitively Coupled Plasma with Various Electrodes and Its Applications;　2019/02
  ANNOUNCEMENT INFO.;　Plasma Science and Technology - Basic Fundamentals and Modern Applications, IntechOpen, Chapter 11, 2019
  AUTHOR;　Yasunori Ohtsu
  
• 第2章「超撥水性表面を形成する材料と表面処理技術」第7節「プラズマCVD法による超撥水性薄膜合成」;　2016/01
  ANNOUNCEMENT INFO.;　, 91-96
  AUTHOR;　
  
• 第4章第2節[5]プラズマコーティングによる基材への凹凸構造形成，撥水膜作製;　2013/07
  ANNOUNCEMENT INFO.;　, 547-553
  AUTHOR;　
  
• Preparation of Zirconium Oxide Thin Film by Plasma Coating Method and its Hydrophobic Nature;　2012/06
  ANNOUNCEMENT INFO.;　Zirconium: Characteristics, Technology and Performance, Editors: Lucy M. King and Kathy E. Allen, Nova Science Publishers (2012)Chapter,1, 1-26
  AUTHOR;　Y.Ohtsu
  
• 第３章　超撥水・超親水化技術とその制御、第1節　コーティング技術による超撥水・超親水化技術、[９]プラズマコーティングによる超撥水性薄膜の合成技術;　2012/05
  ANNOUNCEMENT INFO.;　, 118-127
  AUTHOR;　
  
• 第５章　薄膜製造における最近のトピックス、第１節「スハ゜ッタリンク゛におけるハ゜ーティクル発生機構とその抑制」;　2007
  ANNOUNCEMENT INFO.;　, 5, 373-379
  AUTHOR;　
  

Original Articles

• Effect of multi-cusp magnetic fields to generate a high-density hydrogen plasma inside a low pressure H_2 cylindrical hollow cathode discharge;　2024/09
  ANNOUNCEMENT INFO.;　Vacuum, 227, 113459
  AUTHOR;　Md Hasibul Islam, Takeshi Uchida, Julian Schulze and Yasunori Ohtsu
  
• Characteristics of a hybrid radio-frequency capacitively and inductively coupled plasma using hydrogen gas;　2024/07
  ANNOUNCEMENT INFO.;　Journal of Vacuum Science and Technlogy B, 42, 4, 044204(8pp)
  AUTHOR;　Yasunori Ohtsu, Tatsuo Tabaru and Julian Schulze
  
• Production of a high-density hydrogen plasma in a capacitively coupled RF discharge with a hollow cathode enclosed by magnets;　2024/05
  ANNOUNCEMENT INFO.;　J. Vac. Sci. Technol. A, 42, 3, 033011(9pp)
  AUTHOR;　Yasunori Ohtsu, Takeshi Uchida, Ryohei Kuno and Julian Schulze
  
• Spatial distributions of the ion flux in a capacitive hydrogen RF discharge using a hollow cathode with double toroidal grooves enclosed by magnets;　2023/06
  ANNOUNCEMENT INFO.;　Japanese Journal of Applied Physics, Special Issue: Plasma Processing (ICRP2022), 62, SL, SL1017-1-7
  AUTHOR;　Yasunori Ohtsu, Hokuto Hiwatashi and Julian Schulze
  
• Spatial structures of rf ring-shaped magnetized sputtering plasmas with two facing cylindrical ZnO/Al2O3 targets;　2023/04
  ANNOUNCEMENT INFO.;　Jpn. J. Appl. Phys., 62, SI1007
  AUTHOR;　Yasunori Ohtsu, Kousuke Hara, Shoma Imoto, Julian Schulze, Takeshi Yasunaga and Yasuyuki Ikegami
  
• Temporal evolution of the ion flux to the target in rotational RF multi-magnetron plasma;　2022/08
  ANNOUNCEMENT INFO.;　J. Vac. Sci. Technol. A, 40, 5, 053006(9pp)
  AUTHOR;　Yasunori Ohtsu, Koya Yasuda, and Julian Schulze
  
• Development of a cruciform radio-frequency closed magnetron sputtering source including four sectorial magnetron sputtering discharges for uniform target utilization;　2022/08
  ANNOUNCEMENT INFO.;　Vacuum 202(2022)111184(7pp)
  AUTHOR;　Koya Yasuda, Yasunori Ohtsu and Julian Schulze
  
• Spatial profile of Al-ZnO thin film on polycarbonate deposited by ring-shaped magnetized rf plasma sputtering with two facing cylindrical Al_2O_3 - ZnO targets;　2022/04
  ANNOUNCEMENT INFO.;　Japanese Journal of Applied Physics, 61, SI, pp.SI1005(2022)
  AUTHOR;　Yasunori OHTSU, Godai Sakata, Julian Schulze, Takeshi Yasunaga and Yasuyuki Ikegami
  
• Properties of AZO thin films prepared by stationary and rotating RF magnetized plasma sputtering source;　2022/01
  ANNOUNCEMENT INFO.;　AIP Advances, 12, 1, 015224-1-9
  AUTHOR;　Md. Amzad Hossain, Md. Abdul Majed Patwary, Md. Mustafizur Rahman, Yasunori Ohtsu
  
• Preparation of water-repellent film on a plastic plate by unbalanced radio-frequency magnetron plasma sputtering using PTFE target for a next-generation automobile window;　2021/10
  ANNOUNCEMENT INFO.;　Plasma Chemistry and Plasma Processing, 41, pp.1631-1646 (2021), 41, 6, 1631-1646
  AUTHOR;　Yasunori Ohtsu, Yuta Ino, Yuki Fujio, Tatsuo Tabaru, Takeshi Yasunaga and Yasuyuki Ikegami
  
• Characteristics of a radio frequency magnetized double-ring-shaped hollow cathode plasma source with permanent magnets for high-density hydrogen plasma generation;　2021/08
  ANNOUNCEMENT INFO.;　Vacuum, 193, 110531-1-9
  AUTHOR;　Yasunori Ohtsu, Shoma Imoto, Shunya Takemura, Julian Schulze
  
• Development of rotational maze-shaped RF magnetron plasma for successful target utilization and the thin film preparation;　2021/01
  ANNOUNCEMENT INFO.;　Japanese Journal of Applied Physics, Special Issue: Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials, 60, SA, SAAB01-1-7
  AUTHOR;　Yasunori Ohtsu, Rei Tanaka and Takahiro Nakashima
  
• Characteristics of a rotational windmill-shaped radio frequency magnetron sputtering plasma for effective target utilization;　2020/11
  ANNOUNCEMENT INFO.;　Vacuum, In progress (November 2020), 181, 109593-1-10
  AUTHOR;　Yasunori Ohtsu, Takahiro Nakashima, Rei Tanaka and Julian Schulze
  
• Spatial structure of radio-frequency capacitive discharge plasma with ring-shaped hollow electrode using Ar and O2 mixture gases;　2019/08
  ANNOUNCEMENT INFO.;　Journal of Physics D: Applied Physics, 52, 35, 355202-1-7
  AUTHOR;　Yasunori Ohtsu, Masaya Takasaki and Julian Schulze
  
• Treatment of a polycarbonate plate for a next-generation vehicle window by radio frequency magnetron plasma sputtering using a PVDF target;　2019/06
  ANNOUNCEMENT INFO.;　Japanese Journal of Applied Physics, 58, SE, SEED03-1-6
  AUTHOR;　Yasunori Ohtsu , Yusuke Takada, Kosei Sugawara, Yuki Fujio, and Tatsuo Tabaru
  
• Observation of ring–shaped pulsed DC discharge plasma source using single pole magnet setups for material processing;　2019/06
  ANNOUNCEMENT INFO.;　Radiation Effects and Defects in Solids Incorporating Plasma Science and Plasma Technology, 174, 5-6, 380-396
  AUTHOR;　Md. Amzad Hossain, M. A. Majed Patwary, M. M. Rahman Bhuiyan, Yutaro Nakamura, Kosei Sugawara and Yasunori Ohtsu
  
• Outer Ring-Shaped Radio Frequency Magnetized Plasma Source for Target Utilization in Specific Area;　2018/08
  ANNOUNCEMENT INFO.;　IEEE TRANSACTIONS ON PLASMA SCIENCE, 46, 8, 2894-2900
  AUTHOR;　Md. Amzad Hossain and Yasunori Ohtsu
  
• Atmospheric-pressure plasma jet system for silicon etching without fluorocarbon gas feed;　2018/01
  ANNOUNCEMENT INFO.;　Japanese Journal of Applied Physics, (2018), 57, 1, 01AB01-1-4
  AUTHOR;　Yasunori Ohtsu and Kenta Nagamatsu
  
• RF magnetized ring-shaped plasma for target utilization obtained with circular magnet monopole arrangement;　2018/01
  ANNOUNCEMENT INFO.;　Japanese Journal of Applied Physics, 57, 01AA05(7pp)
  AUTHOR;　Md. Amzad Hossain and Yasunori Ohtsu
  
• Rotational cross-shaped magnetized radio-frequency sputtering plasma source for uniform circular target utilization;　2017/11
  ANNOUNCEMENT INFO.;　Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 35, 061312(6pp)
  AUTHOR;　Tsubasa Ide, Md. Amzad Hossain, Yutaro Nakamura and Yasunori Ohtsu
  
• Performance of a Gyratory Square-Shaped Capacitive Radio Frequency Discharge Plasma Sputtering Source for Materials Processing;　2017/09
  ANNOUNCEMENT INFO.;　Plasma Chem Plasma Process,(2017)., 37, 6, 1663-1677
  AUTHOR;　Md. Amzad Hossain, Yasunori Ohtsu and Tatsuo Tabaru
  
• Spatial structure of radio frequency ring-shaped magnetized discharge sputtering plasma using two facing ZnO/Al2O3 cylindrical targets for Al-doped ZnO thin film preparation;　2017/05
  ANNOUNCEMENT INFO.;　AIP Advances, 7, 055310(8pp)
  AUTHOR;　Takashi Sumiyama, Takaya Fukumoto, Yasunori Ohtsu, and Tatsuo Tabaru
  
• Plasma characteristics and target erosion profile of racetrack-shaped RF magnetron plasma with weak rubber magnets for full circular target utilization;　2016/11
  ANNOUNCEMENT INFO.;　Surface & Coatings Technology, 307, pp.1134-1138
  AUTHOR;　Yasunori Ohtsu, Shohei Tsuruta, Tatsuo Tabaru, Morito Akiyama
  
• High-density radio-frequency magnetized plasma sputtering source with rotational square-shaped arrangement of rod magnets for uniform target utilization;　2016/04
  ANNOUNCEMENT INFO.;　Vacuum, 128, 219-225
  AUTHOR;　Md. Amzad Hossain, T. Ide, K. Ikari, Y. Ohtsu
  
• Capacitive radio frequency discharges with a single ring-shaped narrow trench of various depths to enhance the plasma density and lateral uniformity;　2016/03
  ANNOUNCEMENT INFO.;　PHYSICS OF PLASMAS, 23, 3, 033510(7pp)
  AUTHOR;　Y. Ohtsu, N. Matsumoto, J. Schulze and E. Schuengel
  
• Sustaining mechanism and spatial structure of high-density ring-shaped hollow cuspate magnetized rf plasma for low-pressure plasma processing;　2015/05
  ANNOUNCEMENT INFO.;　Plasma Sources Science and Technology, Special Issue on Electron heating in technological plasmas, 24, 3, 034005(9pp)
  AUTHOR;　Y.Ohtsu and T. Yanagise
  
• Observation of radio frequency ring-shaped hollow cathode discharge plasma with MgO and Al electrodes for plasma processing;　2014/08
  ANNOUNCEMENT INFO.;　Journal of Vacuum Science and Technology A, 32, 3, 031304-1-031304-6
  AUTHOR;　Y. Ohtsu, N. Matsumoto
  
• Production of radio frequency magnetron plasma by monopole arrangement of magnets for target uniform utilization;　2014/04
  ANNOUNCEMENT INFO.;　Vacuum, 101, 403-407
  AUTHOR;　Y. Ohtsu, M. Shigyo, M. Akiyama and T. Tabaru
  
• Radio-frequency magnetized ring-shaped hollow cathode discharge plasma for low-pressure plasma processing;　2014/03
  ANNOUNCEMENT INFO.;　Vacuum, 101, 46-52
  AUTHOR;　Y.Ohtsu, J.Eguchi and Y.Yahata
  
• Production of High-Density Radio Frequency Plasma Source by Ring-Shaped Hollow-Cathode Discharge at Various Trench-Shapes;　2013/08
  ANNOUNCEMENT INFO.;　IEEE TRANSACTIONS ON PLASMA SCIENCE, Special Issue on Ion Sources and Their Applications, 41, 8, 1856-1861
  AUTHOR;　Y.Ohtsu,Y.Yahata, J.Kagami, Y.Kawashimo and T.Takeuchi
  
• Criteria of radio-frequency ring-shaped hollow cathode discharge using H2 and Ar gases for plasma processing;　2013/01
  ANNOUNCEMENT INFO.;　J.Appl.Phys., 113, 3, 033302-1-033302-5
  AUTHOR;　Y.Ohtsu and Y.Kawasaki
  
• Production of Low Electron Temperature Plasma and Coating of Carbon-Related Water Repellent Films on Plastic Plate;　2012/07
  ANNOUNCEMENT INFO.;　IEEE Trans. Plasma Science., Special Issue on Carbon-Related Materials Processing by Plasma Technologies,, 40, 7, 1809-1814
  AUTHOR;　Y.Ohtsu and K.Kihara
  
• A comparison of microwave irradiation, electric, and hybrid heating for medical plastic-waste treatment;　2011/06
  ANNOUNCEMENT INFO.;　Journal of Renewable and Sustainable Energy, 3, 3, 033106-1-033106-7
  AUTHOR;　Y.Ohtsu, K.Onoda, H.Kawashita and H.Urasaki
  
• Preparation of Water-Repellent Thin Film with Inductive Plasma using C2H2F2/Ar gases and Investigation of Its Adhesion by Positively Pulse-Biasing;　2011/04
  ANNOUNCEMENT INFO.;　Trans. Mater. Res. Soc. Jpn, 36, 1, 95-98
  AUTHOR;　Y.Ohtsu, N.Wada, T.Misawa
  
• Production of Dual Frequency Sputtering Plasma for Preparation of Aluminum Nitride Thin Films;　2011/04
  ANNOUNCEMENT INFO.;　Trans. Mater. Res. Soc. Jpn,, 36, 1, 99-102
  AUTHOR;　Y.Ohtsu, K.Hino, T.Misawa, M.Akiyama and K.Yukimura
  
• A simple hollow-probe for monitoring ion-beam energy in processing plasmas;　2010/12
  ANNOUNCEMENT INFO.;　Meas. Sci. Technol., 21, 12, 125405-1-125405-5
  AUTHOR;　Y.Ohtsu and N.Wakita
  
• Development of high-density radio frequency plasma source with a ring-shaped trench hollow electrode for dry processing;　2010/08
  ANNOUNCEMENT INFO.;　Plasma Sources Science and Technology, 19, 4, 045012-1-045012-6
  AUTHOR;　Y.Ohtsu and H.Urasaki
  
• Influence of Xe Gas Concentration on Plasma Parameters and Luminance Characteristics in Fluorescent Lamps driven by an Inductively Coupled Radio Frequency Discharge Using Ne / Xe Mixture Gases;　2010/06
  ANNOUNCEMENT INFO.;　Journal of Light and Visual Environment, 34, 1, 10-15
  AUTHOR;　H.Kashiwazaki, T.Kajiwara, H.Fujita and Y.Ohtsu
  
• Development of novel hybrid microwave-heater reactor for paper-based waste treatment;　2010/04
  ANNOUNCEMENT INFO.;　Journal of Material Cycles and Waste Management, 12, 1, 25-29
  AUTHOR;　Yasunori Ohtsu, Ryuzo Yamada Hiroshi Urasaki, Tatsuya Misawa, Sebastian Popescu and Hiroharu Fujita
  
• INFLUENCE OF INTERNAL PULSED CURRENT ON THE SINTERING BEHAVIOR OF PULSED CURRENT SINTERING PROCESS;　2010/01
  ANNOUNCEMENT INFO.;　, 638-642, 2109-2114
  AUTHOR;　T. Misawa, N.Shikatani, Y. Kawakami, T. Enjoji and Y. Ohtsu
  
• Production of capacitively coupled atmospheric plasma jet with multiring-electrodes for the medical plasma tool;　2009/11
  ANNOUNCEMENT INFO.;　IEEE Trans. Plasma Science, 37, 11, 2221-2227
  AUTHOR;　Yasunori Ohtsu and Shigenori Tanaka
  
• Two-Dimensional Spatial Structure of Inductively Coupled Plasma with One Internal Loop Antenna;　2009/10
  ANNOUNCEMENT INFO.;　 J. Plasma Fusion Res. SERIES, 8, 1291-1294
  AUTHOR;　Y.Ohtsu, K.Aramaki and H.Fujita
  
• Production of high-density capacitively coupled plasma with RF multi-hollow cathode and/or high secondary electron emission for DLC film preparation;　2009/10
  ANNOUNCEMENT INFO.;　Plasma Process and Polymer, 6, S1, S458-S461
  AUTHOR;　Yasunori Ohtsu, Chisa Nakamura, Tatsuya Misawa, Hiroharu Fujita, Morito Akiyama and Ken Yukimura
  
• Improvement of a dual frequency sputtering device for higher deposition rates of protective zirconium oxide films on ceramics;　2009/07
  ANNOUNCEMENT INFO.;　Vacuum, 83, 1364-1367
  AUTHOR;　Yasunori Ohtsu, Yuzuru Hino, Hiroharu Fujita, Morito Akiyama, Ken Yukimura
  
• Observation of internal pulsed current flow through the ZnO specimen in the spark plasma sintering method;　2009/03
  ANNOUNCEMENT INFO.;　Journal of Materials Science, 44, 1641-1651
  AUTHOR;　T.Misawa, N.Shikatani, Y.Kawakami, T. Enjoji, Y.Ohtsu and H.Fujita
  
• Preparation of water-repellent thin film by RF pulse-modulated plasma CVD using C_2H_2F_2 gas;　2008/09
  ANNOUNCEMENT INFO.;　 Surf. Coat. Technol., 202, 5367-5369
  AUTHOR;　Y. Ohtsu, Y.Masuda, S.Yazaki, T.Misawa and H. Fujita
  
• Competing inactivation agents of bacteria spores in radio-frequency oxygen plasma;　2008/06
  ANNOUNCEMENT INFO.;　Plasma Processes & Polymers, 5, 4, 350-358
  AUTHOR;　D.VICOVEANU, S.POPESCU, Y.OHTSU, and H.FUJITA
  
• Production of high-density capacitive plasma by the effects of multi-hollow cathode discharge and high-secondary-electron-emissio;　2008/04
  ANNOUNCEMENT INFO.;　Applied Physic Letters, 92, 17, 171501-1-171501-3
  AUTHOR;　Y.Ohtsu and H.Fujita
  
• Pulsed Discharge Effects on Bacteria Inactivation in Low-Pressure Radio-Frequency Oxygen Plasma;　2008/02
  ANNOUNCEMENT INFO.;　Jpn. J. Appl. Phys., 47, 2, 1130-1135
  AUTHOR;　 Dragos VICOVEANU, Yasunori OHTSU, and Hiroharu FUJITA
  
• ＰＣＳ法により作製したＺｎＯ－ＴｉＯ２－ＣｏＯ－Ａｌ２Ｏ３系熱電材料の抵抗温度特性;　2008/01
  ANNOUNCEMENT INFO.;　, 55, 1, 10-16
  AUTHOR;　
  
• Mirocstructure and Sintering Behavior of ZnO Thermoelectric Materials Prepared by the Pulse-Current –Sintering Method;　2007/10
  ANNOUNCEMENT INFO.;　, 534-536, 1541-1544
  AUTHOR;　Noboru Shikatani, Tatsuya Misawa, Yasunori Ohtsu, Hiroharu Fujita, Yuji Kawakami, Takashi Enjoji
  
• ＰＣＳ法により作製したＺｎＯ－ＴｉＯ２－ＣｏＯ－Ａｌ２Ｏ３セラミックスの熱電特性と微細構造;　2007/01
  ANNOUNCEMENT INFO.;　, 54, 1, 1541-1544
  AUTHOR;　
  
• Langmuir probe data analysis for a magnetized inductive radio-frequency discharge;　2007
  ANNOUNCEMENT INFO.;　J.Appl.Phys., 102, 093022-1-093302-7
  AUTHOR;　 Sebastian POPESCU, Yasunori OHTSU, and Hiroharu FUJITA,
  
• Spatial Behavior of the Plasma Potential in a Magnetized Radio-Frequency Discharge from Emissive Probe Data;　2007
  ANNOUNCEMENT INFO.;　Journal of the Physical Society of Japan, 76, 9, 094501-1-094501-4
  AUTHOR;　Sebastian POPESCU, Yasunori OHTSU, and Hiroharu FUJITA
  
• Ultra-Water Repellency of Films Prepared by Capacitively Coupled C2H2F2/Ar Discharge Plasma;　2007
  ANNOUNCEMENT INFO.;　Jpn. J. Appl. Phys., 46, 27, L679-L681
  AUTHOR;　Yasunori.Ohtsu, NobuhisaYamagami and Hiroharu Fujita
  
• Effect of negative pulsed high-voltage-bias on diamond-like carbon thin film preparation using capacitively coupled radio frequency plasma chemical vapor deposition;　2007
  ANNOUNCEMENT INFO.;　Surf. Coat. Tehcnol., 201, 6674-6677
  AUTHOR;　Y.Ohtsu, H.Noda, C.Nakamura, H.Fujita, K.Yukimura, M.Akiyama and C.Diplasu
  
• Influence of ion-bombardment-energy on thin zirconium oxide films prepared by dual frequency oxygen plasma sputtering;　2007
  ANNOUNCEMENT INFO.;　Surf. Coat. Technol., 201, 6627-6630
  AUTHOR;　Y.Ohtsu,Y.Hino, H.Fujita, K.Yukimura and M.Akiyama
  
• Ar/O2 gas pressure dependences of a pulsed zirconium arc and extracted ion characteristics;　2007
  ANNOUNCEMENT INFO.;　Surf. Coat. Technol., 201, 6550-6552
  AUTHOR;　Ken Yukimura, Hiroyuki Ono, Shuhei Akashi, Xinxin Ma, Yasunori Ohtsu, Hiroharu Fujita and Keiji Nakamura
  
• パルス電流焼結法を用いた酸化亜鉛系セラミックスの焼結に対する試料内部電流の影響;　2006/10
  ANNOUNCEMENT INFO.;　, 53, 10, 830-835
  AUTHOR;　
  
• Current-free double-layer formation in inductively coupled plasma in a uniform magnetic field;　2006
  ANNOUNCEMENT INFO.;　Phys. Rev. E, 73, 066406-1-066405-8
  AUTHOR;　"S. Popescu, Y. Ohtsu, and H. Fujita"
  
• Influences of oxide material on high density plasma production using capacitively coupled discharge;　2006
  ANNOUNCEMENT INFO.;　Thin Solid Films, 506-507, 545-549
  AUTHOR;　"Y.Ohtsu, T.Shimazoe, T.Misawa and H.Fujita"
  
• Ar/O2 gas pressure dependence of atomic concentration of zirconia prepared by zirconium pulse arc PBII& D;　2006
  ANNOUNCEMENT INFO.;　"Nuclear Instruments and Methods in Physics Research Section B", 242, 318-320
  AUTHOR;　"K.Yukimura, H.Yoshinaga, Y.Ohtsu, H.Fujita, K.Nakamura and X.Ma"
  
• Preparation of zirconium oxide thin film using inductively coupled oxygen plasma sputtering;　2005
  ANNOUNCEMENT INFO.;　SURFACE AND COATINGS TECHNOLOGY, 196, 1/3, 81-84
  AUTHOR;　Ohtsu, Y / Egami, M / Fujita, H / Yukimura, K
  
• Energy Distribution of Ions Incident onto a Dc-Biased Substrate in Electron Cyclotron Resonance Sputtering Plasma for SrTiO~3 Thin Film Preparation;　2004
  ANNOUNCEMENT INFO.;　JAPANESE JOURNAL OF APPLIED PHYSICS PART 1 REGULAR PAPERS SHORT NOTES AND REVIEW PAPERS, 43, 1, 328-331
  AUTHOR;　Ohtsu, Y / Fujita, H / Niino, A / Matsumoto, T / Miyake, S
  
• Energy distribution functions of ions impinging on substrate in microwave plasma;　2004
  ANNOUNCEMENT INFO.;　JOURNAL OF PHYSICS -D- APPLIED PHYSICS, 37, 3, 438-444
  AUTHOR;　Mesko, M / Cicman, P / Ohtsu, Y / Fujita, H / Kudrle, V
  
• Influences of gap distance on plasma characteristics in narrow gap capacitively coupled radio-frequency discharge;　2004
  ANNOUNCEMENT INFO.;　Jpn.J.Appl.Phys.,, 43, 2, 795-799
  AUTHOR;　Y.Ohtsu and H.Fujita
  
• Influence of Substrate Biasing on (Ba,Sr)TiO~3 Films Prepared by Electron Cyclotron Resonance Plasma Sputtering;　2004
  ANNOUNCEMENT INFO.;　JAPANESE JOURNAL OF APPLIED PHYSICS PART 1 REGULAR PAPERS SHORT NOTES AND REVIEW PAPERS, 43, 3, 1144-1148
  AUTHOR;　Matsumoto, T / Niino, A / Ohtsu, Y / Misawa, T / Yonesu, A / Fujita, H / Miyake, S
  
• High ozone generation with a high-dielectric constant material;　2004
  ANNOUNCEMENT INFO.;　Jpn.J.Appl.Phys.,, 43, 7, 4368-4372
  AUTHOR;　M.Toyofuku (D 3), Y.Ohtsu and H.Fujita
  
• Measurement of ion temperature in magnetized inductively coupled plasma with external helical antenna;　2004
  ANNOUNCEMENT INFO.;　PHYSICS LETTERS A, 327, 4, 327-331
  AUTHOR;　Mihaila, I / Ohtsu, Y / Fujita, H
  
• Production of high-density capacitively coupled radio-frequency discharge plasma by high-secondary-electron-emission oxide;　2004
  ANNOUNCEMENT INFO.;　APPLIED PHYSICS LETTERS, 85, 21, 4875-4877
  AUTHOR;　Ohtsu, Y / Fujita, H
  
• Time-Averaged Energy Distribution Function of Ions Impacted on an RF-biased Substrate in Electron Cyclotron Resonance Microwave Plasma;　2003
  ANNOUNCEMENT INFO.;　JAPANESE JOURNAL OF APPLIED PHYSICS PART 1 REGULAR PAPERS SHORT NOTES AND REVIEW PAPERS, 42, 12, 7552-7556
  AUTHOR;　Ohtsu, Y / Yoshinaga, K / Fujita, H
  
• Annular profile of dust density near RF powered electrode in a capacitively coupled plasma;　2002/04
  ANNOUNCEMENT INFO.;　Jpn.J.Appl.Phys., 41, 4, 2195-2198
  AUTHOR;　Y.Ohtsu and H.Fujita,
  
• 無電極放電プラズマにおける蛍光体発光輝度と発光色に与える電子エネルギーの影響;　2001/05
  ANNOUNCEMENT INFO.;　, 85, 5, 332-337
  AUTHOR;　
  
• パルス変調高周波放電における蛍光体発光色の観測;　2000/05
  ANNOUNCEMENT INFO.;　, 84, 5, 124-127
  AUTHOR;　
  
• 高周波アフターグロープラズマにおける電子密度の増加機構;　2000/01
  ANNOUNCEMENT INFO.;　, 120, 1, 31-36
  AUTHOR;　
  
• Energy distribution functions of ions impacted on a negatively biased substrate in an electron cyclotron resonance microwave plasma;　1999/07
  ANNOUNCEMENT INFO.;　Jpn.J.Appl.Phys., 38, 7, 4393-4396
  AUTHOR;　Y.Ohtsu, K.Mori and H.Fujita
  
• 容量結合型高周波プラズマ中の電子エネルギー分布関数とイオン衝撃２次電子の観測;　1999/06
  ANNOUNCEMENT INFO.;　電気学会論文誌Ａ, 119, 6, 866-871
  AUTHOR;　
  
• A new sputtering device of radio-frequency magnetron discharge using a rectangular hollow-shaped electrode;　1998/04
  ANNOUNCEMENT INFO.;　Rev. Sci.Instrum., 69, 4, 1833-1836
  AUTHOR;　Y.Ohtsu, Y.Tsurume and H.Fujita,
  
• Measurement of ion energy distribution functions in an radio frequency plasma excited with an m=0 mode helical antenna and thin film preparation;　1997/07
  ANNOUNCEMENT INFO.;　Jpn.J.Appl.Phys., 36, 7, 4620-4624
  AUTHOR;　Y.Ohtsu, G.Tochitani, H.Fujita, J.Zhang, Y.Setsuhara and H.Fujita
  
• Potential oscillations in an electronegative plasma driven by an asymmetry RF discharge;　1997/07
  ANNOUNCEMENT INFO.;　Jpn.J.Appl.Phys., 36, 7, 4722-4727
  AUTHOR;　M.M.Nasser, Y.Ohtsu, G.Tochitani and H.Fujita
  
• Ion collection by a hollow probe in ECR microwave plasma under a divergent magnetic field;　1997/05
  ANNOUNCEMENT INFO.;　Jpn.J.Appl.Phys., 36, 5, 2894-2895
  AUTHOR;　Y.Ohtsu, K.Kinoshita and H.Fujita
  
• Temporal evolution of charged particles in a radio frequency afterglow plasma containing negative ions;　1996/08
  ANNOUNCEMENT INFO.;　Jpn.J.Appl.Phys., 35, 8, 4494-4497
  AUTHOR;　Y.Ohtsu, T.Seki and H.Fujita
  
• Spatial structure of electrons and fluorine atoms in a CF4 RF magnetron plasma;　1996/05
  ANNOUNCEMENT INFO.;　Plasma Sources Sci Technol., 5, 5, 344-348
  AUTHOR;　Y.Ohtsu, H.Matsuo and H.Fujita
  
• Potential structure in asymmetrical radio frequency discharges containing negative ions “;　1994/09
  ANNOUNCEMENT INFO.;　Phys.Lett. A, 193, 9, 94-96
  AUTHOR;　Y.Okuno, Y.Ohtsu and H.Fujita
  
• CF3, CF2 and CF radical measurements in RF CHF3 etching plasma using infrared diode laser absorption spectroscopy;　1994/07
  ANNOUNCEMENT INFO.;　Jpn.J.Appl.Phys., 33, 7, 4298-4302
  AUTHOR;　K.Maruyama. K.Ohkouchi, Y.Ohtsu and T.Goto
  
• Effect of downstream magnetic field collimation on ion behavior in electron cyclotron resonance microwave plasma;　1994/06
  ANNOUNCEMENT INFO.;　 IEEE Trans. Plasma Sci., 22, 6, 253-259
  AUTHOR;　Y.Okuno, Y.Ohtsu and H.Fujita,
  
• Electron acceleration resonant with sheath motion in a low-pressure radio frequency discharge;　1994/03
  ANNOUNCEMENT INFO.;　Appl.Phys.Lett., 64, 3, 1623-1625
  AUTHOR;　 Y.Okuno, Y.Ohtsu and H.Fujita
  
• Two-dimensional ion velocity distribution functions in electron cyclotron resonance plasma under a divergent magnetic field;　1993/11
  ANNOUNCEMENT INFO.;　J.Appl.Phys.,, 74, 11, 5990-5996
  AUTHOR;　Y.Okuno, Y.Ohtsu and H.Fujita
  
• Measurement of ion temperature in electron cyclotron resonance plasma;　1993/11
  ANNOUNCEMENT INFO.;　Jpn.J.Appl.Phys, 32, 11, L1698-L1700
  AUTHOR;　Y.Okuno, Y.Ohtsu, H.Fujita, W.Chen, S.Miyake
  
• Effect of RF-biased electrode on microwave plasma;　1993/06
  ANNOUNCEMENT INFO.;　Jpn.J.Appl.Phys., 32, 6, 2873-2877
  AUTHOR;　Y.Ohtsu, Y.Okuno and H.Fujita
  
• Observation of radio-frequency discharges at various frequencies;　1993/03
  ANNOUNCEMENT INFO.;　J.Appl.Phys., 73, 3, 2155-2159
  AUTHOR;　Y.Ohtsu, Y.Okuno and H.Fujita
  
• Measurement of electron energy distribution function in an asymmetric radio frequency discharge plasma;　1993/02
  ANNOUNCEMENT INFO.;　J.Appl.Phys., 73, 2, 1612-1616
  AUTHOR;　Y.Okuno, Y.Ohtsu, C.Komatsu and H.Fujita
  
• Measurement of electron energy distribution function in a low pressure rf discharge plasma;　1992/05
  ANNOUNCEMENT INFO.;　Jpn.J.Appl.Phys,, 31, 5, 1503-1504
  AUTHOR;　S.Yagura, Y.Okuno, Y.Ohtsu and H.Fujita
  
• Modulation of electron velocity distribution function by moving cathode sheath in a low pressure rf discharge;　1992/04
  ANNOUNCEMENT INFO.;　Jpn.J.Appl.Phys, 31, 4, 1194-1198
  AUTHOR;　Y.Okuno, Y.Ohtsu and H.Fujita
  
• Control of plasma parameters and electric fields in a microwave-rf hybrid plasma;　1991/05
  ANNOUNCEMENT INFO.;　J.Appl.Phys, 67, 5, 6114-6117
  AUTHOR;　Hiroharu Fujita, Yoshihiro Okuno, Yasunori Ohtsu,Shinya Yagura
  

Material, Commentary, Editorials, Research Report, A Comprehensive Journal Articles

• プラズマ表面改質により作製した機能性超撥水性膜;　2017/12
  ANNOUNCEMENT INFO.;　, 52, 12, 647-655
  AUTHOR;　
  
• 機能性薄膜材料ターゲット有効利用のためのスパッタプラズマ装置の開発;　2015/03
  ANNOUNCEMENT INFO.;　
  AUTHOR;　T.Ide, Y.Ohtsu, T.Tabaru and M.Akiyama
  
• 機能性薄膜材料ターゲット有効利用のための磁化プラズマ装置の開発;　2014/03
  ANNOUNCEMENT INFO.;　, 11-15
  AUTHOR;　
  
• シリーズ研究室紹介「佐賀大学大学院工学系研究科電気電子工学専攻　研究グループB　プラズマエレクトロニクス研究室」;　2012/02
  ANNOUNCEMENT INFO.;　, 22, 2, 71-73
  AUTHOR;　
  
• 高周波スパッタリングによりAlN薄膜合成;　2011/03
  ANNOUNCEMENT INFO.;　, 15-16
  AUTHOR;　
  
• 第１４回「連携大学院方式」共同研究・特定プロジェクト研究報告書（第１２回連携大学院産学官交流セミナー要旨集）「ナノ材料の新規特性と開発」;　2010/03
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Preparation of Water-Repellent Films by Plasma-Coating and its Application;　2010/01
  ANNOUNCEMENT INFO.;　Trans. IEE Jpn, A, 130, 1, 6-9
  AUTHOR;　Yasunori Ohtsu
  
• 「次世代大型低消費電力プラズマディスプレイ基盤技術開発」中間評価報告書;　2009/10
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• メタルスパッタリングプラズマの高度化とその最新動向ーハードコーティングー;　2009/07
  ANNOUNCEMENT INFO.;　, 1162, 46-49
  AUTHOR;　
  
• ＬＳＩを高品質で安定に量産するための半導体製造装置の開発を目指した部材および構成機器に関する調査研究;　2009/03
  ANNOUNCEMENT INFO.;　, 1-39
  AUTHOR;　
  
• 高周波スパッタ中の炭素微粒子の発生と成長過程;　2008/04
  ANNOUNCEMENT INFO.;　, 51, 4, 254-257
  AUTHOR;　
  
• 大気圧プラズマによる微生物担体セラミックスの再利用;　2008/03
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 2008リフレッシュ理科教室（九州支部佐賀会場）開催報告“キミは未来の科学者だ！”～光・音・かぜ・・・～;　2008
  ANNOUNCEMENT INFO.;　, 32, 2, 89-91
  AUTHOR;　
  
• エネルギーの異なるプラズマイオン交互注入による高密着性炭素系硬質膜の合成技術;　2007/03
  ANNOUNCEMENT INFO.;　, 1-10
  AUTHOR;　
  
• 電子レンジ・携帯電話にみる電磁波体験型科学創造性育成法の開発;　2007/02
  ANNOUNCEMENT INFO.;　, 359-368
  AUTHOR;　
  
• 高２次電子放出・強誘電体酸化物電極による 高圧気体マイクロプラズマ低エネルギー生成;　2007
  ANNOUNCEMENT INFO.;　, 77-86
  AUTHOR;　
  
• 200７年度リフレッシュ理科教室（九州支部佐賀会場）開催報告「キミは未来の科学者だ！エネルキ゛ーをつくる、エネルキ゛ーをつかう」;　2007
  ANNOUNCEMENT INFO.;　, 31, 2, 127-129
  AUTHOR;　
  
• 200６年度リフレッシュ理科教室（九州支部佐賀会場）開催報告「キミは未来の科学者だ！通信の科学」;　2006
  ANNOUNCEMENT INFO.;　, 30, 2, 89-92
  AUTHOR;　
  
• 高２次電子放出・強誘電体酸化物電極による 高圧気体マイクロプラズマ低エネルギー生成;　2006
  ANNOUNCEMENT INFO.;　, 77-86
  AUTHOR;　
  
• 高周波スパッタによる炭素微粒子合成と成長過程;　2006
  ANNOUNCEMENT INFO.;　, 22, 1, 19-28
  AUTHOR;　
  
• 生徒体験型オーロラ実験に関する教材開発;　2005
  ANNOUNCEMENT INFO.;　, 189-198
  AUTHOR;　
  
• 2005年度リフレッシュ理科教室（九州支部佐賀会場）開催報告「キミは未来の科学者だ！～サイエンスマジック～」;　2005
  ANNOUNCEMENT INFO.;　, 29, 2, 43-46
  AUTHOR;　
  
• 2003年度リフレッシュ理科教室報告：「佐賀でのリフレッシュ理科教室ー身近なもので理科を楽しもうー」;　2004
  ANNOUNCEMENT INFO.;　, 73, 5, 654-655
  AUTHOR;　
  
• 2004年度リフレッシュ理科教室（九州支部佐賀会場）開催報告;　2004
  ANNOUNCEMENT INFO.;　, 28, 2, 33-35
  AUTHOR;　
  
• 誘導結合型高周波スパッタリングによる酸化ジルコニウム薄膜合成;　2004
  ANNOUNCEMENT INFO.;　, 24
  AUTHOR;　
  
• 強誘電体薄膜合成用ECRマイクロ波プラズマにおける基板入射イオンエネルギー分布の計測;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Development of Deuterium Negative Ion Sources and its Database Construction;　2003
  ANNOUNCEMENT INFO.;　Annual Report of National Institute for Fusion Science, April 2002-March 2003,p223.
  AUTHOR;　Fukumasa, O., Naitou, H., Sakiyama, S. Tauchi, Y., Sawada, K., Fujita, H. Ohtsu, Y. Hamabe, M., Takeiri, Y.,
  
• Development of a New Type Pellet Injector with Continuously Variable System of Pellet Size for LHD;　2003
  ANNOUNCEMENT INFO.;　Annual Report of National Institute for Fusion Science, April 2002-March 2003,p231.
  AUTHOR;　Sato, K.N., Imada, S., Mase, A., Sakakita, H., Fujita, H., Ohtsu, Y., Misawa, T., Sakamoto, R., Yamada, H., Yamazaki, K.
  
• Basic Process of Solid Hydrogen Ablation by Plasma;　2003
  ANNOUNCEMENT INFO.;　Annual Report of National Institute for Fusion Science, April 2002-March 2003,p308.
  AUTHOR;　 Fujita, H. Ohtsu, Y., Misawa, T., Sato, K.N., Yoshimura, S,
  

General Lectures

• フッ素系樹脂ターゲットを用いた高周波マグネトロンプラズマの空間分布;　2024/12
  ANNOUNCEMENT INFO.;　, 7748-1
  AUTHOR;　
  
• 対向AZO円筒型ターゲットを⽤いたリング状ホロー磁化放電スパッタ装置の開発;　2024/12
  ANNOUNCEMENT INFO.;　, 7718-2
  AUTHOR;　
  
• ターゲット有効利用の為の回転型マルチマグネトロンスパッタ装置の開発;　2024/12
  ANNOUNCEMENT INFO.;　, 7718-3
  AUTHOR;　
  
• 円筒・リング型ハイブリッドホロー電極と磁⽯を⽤いた⾼密度⽔素RFプラズマの⽣成;　2024/12
  ANNOUNCEMENT INFO.;　, 7748-4
  AUTHOR;　
  
• Impact of like-pole-aligned hybrid MCMF on hydrogen plasma density inside a low-pressure RF driven CCP discharge with a hollow cathode;　2024/11
  ANNOUNCEMENT INFO.;　, P-45, 119-120
  AUTHOR;　Md. H. Islam and Y. Ohtsu
  
• Production of a hybrid RF capacitively and inductively coupled plasma using CH4 and H mixture gases for preparing carbon nanostructures;　2024/11
  ANNOUNCEMENT INFO.;　Proceedings of The 45th International Symposium on Dry Process (DPS2024), P-46, 121-122
  AUTHOR;　Y. Ohtsu, T. Tabaru and J. Schulze
  
• 対向円筒ターゲットを用いた高周波リング状磁化プラズマ生成に及ぼす磁石配置の影響;　2024/09
  ANNOUNCEMENT INFO.;　, 20a-A32-3,07-116
  AUTHOR;　
  
• PFAターゲットを用いた高周波マグネトロンプラズマの空間分布;　2024/09
  ANNOUNCEMENT INFO.;　, 20a-A32-4,07-117
  AUTHOR;　
  
• ターゲット有効利用のための回転型マルチマグネトロンスパッタ装置の開発;　2024/09
  ANNOUNCEMENT INFO.;　, 20p-A32-4,07-140
  AUTHOR;　
  
• 円筒・リング型ハイブリッドホロー電極と磁石を用いた高密度水素RFプラズマの生成;　2024/09
  ANNOUNCEMENT INFO.;　, 20p-A32-5,07-141
  AUTHOR;　
  
• Enhancement of high-density hydrogen-plasma production using cylindrical-shaped hollow cathode at a lower H2 gas pressure by multi-cusp magnetic fields;　2024/03
  ANNOUNCEMENT INFO.;　
  AUTHOR;　Md Hasibul Islam, Takeshi Uchida and Yasunori Ohtsu
  
• Characteristics of RF hybrid-plasma using hydrogen gas;　2024/03
  ANNOUNCEMENT INFO.;　Proc. ISPlasma2024//IC-PLANTS2024/APSPT-13, Nagoya Univ. 2024.3.5
  AUTHOR;　Yasunori Ohtsu, Tatsuo Tabaru and Julian Schulze
  
• Production of high-density hydrogen plasma by RF magnetized hollow cathode discharge with magnet;　2023/11
  ANNOUNCEMENT INFO.;　Proc. 44th International Symposium on Dry Process (DPS2023), Nagoya, Nov.21-22,, 44, 107-108 (P-32)
  AUTHOR;　Y. Ohtsu, T. Uchida, R. Kuno and J. Schulze
  
• Production of radio-frequency hybrid-discharge plasma using hydrogen gas for thin film preparation;　2023/10
  ANNOUNCEMENT INFO.;　Bulletin of the American Physical Society, 76th Annual Gaseous Electronics Conference, Michigan, IT4.36
  AUTHOR;　Yasunori Otsu and Tatsuo Tabaru
  
• 小型マグネトロンプラズマのアレー状配置型高周波マグネトロンスパッタ源に及ぼす磁石位置の影響;　2023/09
  ANNOUNCEMENT INFO.;　, 23p-A301-11
  AUTHOR;　
  
• 円筒対向ターゲットを用いた高周波リング状ホロー磁化プラズマ生成に及ぼす磁石配置の影響;　2023/09
  ANNOUNCEMENT INFO.;　第84回応用物理学会秋季学術講演会, 23p-A301-12
  AUTHOR;　
  
• フッ素樹脂ターゲットを用いた高周波マグネトロンプラズマの空間分布計測;　2023/09
  ANNOUNCEMENT INFO.;　, 23p-A301-13
  AUTHOR;　
  
• 永久磁石を用いた高周波磁化ホロー陰極放電による高密度水素プラズマ生成とその空間分布の計測;　2023/09
  ANNOUNCEMENT INFO.;　, 23p-A301-14
  AUTHOR;　
  
• Production of high-density hydrogen plasma by radio-frequency hybrid-discharge for thin film preparation;　2023/03
  ANNOUNCEMENT INFO.;　, 15p-PA02-2
  AUTHOR;　Yasunori Ohtsu, Tatsuo Tabaru
  
• Spatial structures of rf ring-shaped magnetized sputtering plasma with two facing cylindrical ZnO/ Al2O3 targets;　2022/11
  ANNOUNCEMENT INFO.;　Proc. of 43rd International Symposium on Dry process, Osaka, Nov. 24-25, P-18, 71-72
  AUTHOR;　Y. Ohtsu, K. Hara, S. Imoto, J. Schulze, T. Yasunaga, Y. Ikegami
  
• Spatial distributions of hydrogen RF discharge plasma using a hollow cathode with double toroidal grooves combined with magnets;　2022/10
  ANNOUNCEMENT INFO.;　Proc. 11th International Conference on Reactive Plasmas (ICRP-11), 2022 Gaseous Electronics Conference (GEC 2022), HW6.00042, 231-232
  AUTHOR;　Yasunori Ohtsu, Hokuto Hiwatashi and Julian Schulze
  
• 対向円筒型AZOターゲットを用いた高周波リング状ホロー磁化プラズマの空間分布とAZO薄膜合成;　2022/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ターゲット有効利用のための小型マグネトロンプラズマのアレー状配置型高周波マグネトロンスパッタ源の開発;　2022/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 高密度水素プラズマ生成のための永久磁石を用いた高周波磁化ホロー陰極放電装置の開発;　2022/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 対向円筒型 AZO ターゲットを用いた高周波リング状ホロー磁化プラズマの空間 分布;　2021/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 小型マグネトロンプラズマを組み合わせた回転型アレー状高周波マグネトロンスパッタプラズマの開発;　2021/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Spatial profile of Al-ZnO thin film on polycarbonate deposited by ring-shaped magnetized rf plasma sputtering with two facing cylindrical Al2O3-ZnO targets;　2021/11
  ANNOUNCEMENT INFO.;　42th International Symposium on Dry Process（DPS2021), P-24(2021.11.18)
  AUTHOR;　Y.Ohtsu, G. Sakata, J. Schulze, T. Yasunaga and Y. Ikegami
  
• ターゲット有効利用のための磁石回転型マグネトロンスパッタ装置の開発;　2021/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 円筒対向ターゲットスパッタのための高周波リング状ホロー磁化プラズマの生成;　2021/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Synthesis and/or evaluation of PTFE water-repellent thin film on polycarbonate plate by unbalanced magnetron sputtering;　2020/12
  ANNOUNCEMENT INFO.;　, 24, 51-52
  AUTHOR;　Y.Ino,Y.Ohtsu, T.Yasunaga,Y.Ikegami,T.Tabaru,Y.Fujio
  
• Improvement of target erosion distribution by novel rotational magnet arrangement for RF magnetron sputtering plasma;　2020/12
  ANNOUNCEMENT INFO.;　, 24, 53-54
  AUTHOR;　Koya YASUDA, Yasunori OHTSU
  
• Synthesis of transparent conductive oxide film by RF plasma sputtering using two facing cylindrical targets and its spatial distribution;　2020/12
  ANNOUNCEMENT INFO.;　, 24, 49-50
  AUTHOR;　Kodai Sakata1, Yasunori Ohtsu1
  
• アンバランスマグネトロンスパッタ装置の構築と ポリカーボネート板への PTFE 撥水性薄膜合成;　2020/09
  ANNOUNCEMENT INFO.;　, 8a-Z04-15
  AUTHOR;　
  
• ターゲット有効利用のための新規磁石配置による回転型高周波マグネトロンスパッタリング装置の開発;　2020/09
  ANNOUNCEMENT INFO.;　, 8p-Z21-1
  AUTHOR;　
  
• Development of rotational maze-shaped RF magnetron plasma for successful target utilization and the thin film preparation;　2020/03
  ANNOUNCEMENT INFO.;　ISPlasma2020/IC-PLANTS2020, Nagoya, March 10, 10P2-06
  AUTHOR;　Yasunori Ohtsu, Rei Tanaka and Takahiro Nakashima
  
• 回転迷路型高周波マグネトロンスパッタ装置の開発とその評価;　2019/12
  ANNOUNCEMENT INFO.;　, B-4
  AUTHOR;　
  
• アルゴン・酸素混合ガスを用いた高周波ホロー陰極放電プラズマアッシングの酸素濃度依存性と分光特性;　2019/12
  ANNOUNCEMENT INFO.;　, P-05
  AUTHOR;　
  
• 高周波マグネトロンスパッタリングによる金属板表面へのPVDF薄膜合成 ·;　2019/12
  ANNOUNCEMENT INFO.;　, P-23
  AUTHOR;　
  
• アンバランスマグネトロンスパッタによる次世代自動車窓材プラスチック板への撥水性薄膜合成·;　2019/12
  ANNOUNCEMENT INFO.;　, P-32
  AUTHOR;　
  
• Production of double ring-shaped magnetized radio-frequency hydrogen high-density plasma;　2019/11
  ANNOUNCEMENT INFO.;　2019 International Symposium on Dry Process, P-32, 119-120
  AUTHOR;　Y. Ohtsu, K. Kawabata, K. Aso and J. Schulze
  
• ターゲット利用率向上 を目的とした回転迷路型 RF マグネトロンスパッタ装置の開発 とその評価;　2019/09
  ANNOUNCEMENT INFO.;　, 20p-B11-5
  AUTHOR;　
  
• アルゴン・酸素混合ガスを用いた高周波ホロー陰極放電プラズマの生成と分光特性;　2019/09
  ANNOUNCEMENT INFO.;　, 20p-B11-6
  AUTHOR;　
  
• 次世代自動車窓材プラスチック板への撥水性薄膜合成のための高周波マグネトロンスパッタ装置の開発;　2019/09
  ANNOUNCEMENT INFO.;　, 20p-B11-7
  AUTHOR;　
  
• Characteristics of Aluminum doped zinc oxide film prepared using RF magnetized plasma sputtering source with square-shaped magnet setup;　2019/03
  ANNOUNCEMENT INFO.;　Proc. 11th International Symposium on Advanced Plasma Science and its Applications for Nitrides and Nanomaterials, 19pE19O
  AUTHOR;　M. A. Hossain, Y.Nakamura, K. Sugawara and Y.Ohtsu
  
• 高周波ホロー陰極放電プラズマによるポリイミドフィルムの高速アッシング;　2018/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ターゲット利用率向上を目的とした回転迷路型高周波マグネ トロンスパッタ装置の開発;　2018/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 低気圧水素ガスにおけるホロー陰極効果と磁場閉 じ込めを用いた高密度水素プラズマの計測;　2018/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 回転型マグネトロンスパッタ装置の開発とAZO 膜合成;　2018/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• RFスパッタ法によるポリカーボネート上へのAZO膜及びPVDF膜合成;　2018/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Treatment of polycarbonate plate for next-generation vehicle window by radio frequency magnetron plasma sputtering with an arrangement of cylindrical magnets;　2018/11
  ANNOUNCEMENT INFO.;　Proc. of 40th anniversary International Symposium on Dry Process (DPS2018), 40, 151-152
  AUTHOR;　Y. Ohtsu, Y. Takada, K. Sugawara, Y. Fujio and T. Tabaru
  
• RFスパッタによるポリカーボネートへのAZOとPVDFの薄膜合成;　2018/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• アルゴン酸素混合ガスを用いた高周波ホロー陰極放電プラズマによるポリイミドアッシングの特性;　2018/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ホロー陰極効果と磁場閉じ込め効果を用いた低気圧高密度水素プラズマ源の生成;　2018/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ターゲット有効利用のための回転型二重マグネトロンスパッタ装置の開発;　2018/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ターゲット利用率向上のための回転十字型高周波マグネトロンスパッタ装置の開発;　2018/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• “Preparation of aluminum doped zinc oxide film by radio-frequency magnetized plasma sputtering source with square-shaped rod magnets;　2018/06
  ANNOUNCEMENT INFO.;　19th International Congress on Plasma Physics (ICPP 2018), Vancouver, Canada
  AUTHOR;　M. A. Hossain, Y. Nakamura, A. Sugawara, and Y. Ohtsu,
  
• 高周波スパッタを用いたポリカーボネートへのAZO及びPVDF薄膜合成;　2017/12
  ANNOUNCEMENT INFO.;　, 21-22
  AUTHOR;　
  
• 薄膜材料ターゲット有効利用のための回転型レーストラック状マグネトロンスパッタ装置の開発;　2017/12
  ANNOUNCEMENT INFO.;　, 25-26
  AUTHOR;　
  
• ホロー電極と磁石を用いた低気圧高密度水素プラズマの生成;　2017/12
  ANNOUNCEMENT INFO.;　, 29-30
  AUTHOR;　
  
• ホロー電極を用いたAr-O2混合高周波プラズマの空間構造;　2017/12
  ANNOUNCEMENT INFO.;　, 33-34
  AUTHOR;　
  
• 高周波マグネトロンスパッタリングによるポリカーボネート上への撥水性PTFE薄膜合成;　2017/12
  ANNOUNCEMENT INFO.;　, 67-68
  AUTHOR;　
  
• 高周波磁化ホロー放電電極を用いた低気圧高密度水素負イオンの生成;　2017/12
  ANNOUNCEMENT INFO.;　, 81-82
  AUTHOR;　
  
• ターゲット有効利用のための回転十字型マグネトロンスパッタ装置の開発;　2017/12
  ANNOUNCEMENT INFO.;　, 85-86
  AUTHOR;　
  
• 酸素ガスを用いた高周波ホロー陰極放電プラズマによるポリイミドアッシングの高速化;　2017/12
  ANNOUNCEMENT INFO.;　, 89-90
  AUTHOR;　
  
• Plasma characteristics and performance of rotational square-shaped RF plasma sputtering source;　2017/12
  ANNOUNCEMENT INFO.;　, 123-124
  AUTHOR;　Md. Amzad Hossain, Yasunori Ohtsu
  
• Ring-Shaped Plasma for Target Utilization in Specific Area by HiPIMS Source;　2017/11
  ANNOUNCEMENT INFO.;　39th International Symposium on Dry Process, 2017, P-36, 39, 121-122
  AUTHOR;　Md. Amzad Hossain, Yasunori Ohtsu
  
• 低気圧高密度プラズマ生成のための高周波磁化ホロー放電電極の開発;　2017/09
  ANNOUNCEMENT INFO.;　, 7p-PA3-3
  AUTHOR;　
  
• 薄膜材料ターゲット有効利用のための回転型マグネトロンスパッタ装置の設計;　2017/09
  ANNOUNCEMENT INFO.;　, 7p-PA3-2
  AUTHOR;　
  
• 高周波スパッタによるポリカーボネートへのAZO薄膜合成とその応用;　2017/09
  ANNOUNCEMENT INFO.;　, 8a-PB4-3
  AUTHOR;　^M 菅原光星、大津康徳
  
• Ar-O2混合ガスを用いた高周波プラズマの空間構造;　2017/09
  ANNOUNCEMENT INFO.;　, 8a-PB3-5
  AUTHOR;　
  
• Outer Circular Ring-Shaped RF Magnetized Plasma for Specific Area Target Utilization by Magnetic Monopole Arrangement;　2017/05
  ANNOUNCEMENT INFO.;　44th International Conference on Plasma Science, WE Poster-5, 21-25 May 2017, Seton Hall Univ., USA
  AUTHOR;　Md. Amzad Hossain and Yasunori Ohtsu
  
• RF Magnetized Ring-Shaped Plasma for Uniform Cu Target Utilization by Circular Magnets Monopole Arrangement;　2017/03
  ANNOUNCEMENT INFO.;　ISPlasma 2017, Chubu Univ.
  AUTHOR;　Md. Amzad Hossain and Yasunori Ohtsu
  
• Surface treatment of silicon wafer by atmospheric pressure plasma jet with a tungsten rod coated by C2F4;　2017/03
  ANNOUNCEMENT INFO.;　ISPlasma 2017, Chubu Univ., 201703
  AUTHOR;　Yasunori Ohtsu and Kenta Nagamatsu
  
• 高周波水素プラズマ中のプラズマパラメータ計測;　2016/12
  ANNOUNCEMENT INFO.;　, 20, 21-22
  AUTHOR;　
  
• ポリマー材料を用いた高周波マグネtロンスパッタによる撥水性薄膜合成;　2016/12
  ANNOUNCEMENT INFO.;　, 20, 73-74
  AUTHOR;　
  
• 対向円筒型ターゲットを用いたリング状磁化放電スパッタによる低抵抗AZO薄膜合成;　2016/12
  ANNOUNCEMENT INFO.;　, 20, 77-78
  AUTHOR;　
  
• Ar-O2混合RFプラズマ中の空間構造のプローブ計測;　2016/12
  ANNOUNCEMENT INFO.;　, 20, 81-82
  AUTHOR;　
  
• 角型磁石を用いた高周波マグネトロンスパッタ装置の開発と銅ターゲットの有効利用;　2016/12
  ANNOUNCEMENT INFO.;　, 20, 107-108
  AUTHOR;　
  
• 円筒型AZO対向ターゲットを用いた高周波スパッタプラズマの空間構造;　2016/12
  ANNOUNCEMENT INFO.;　, 20, 115-116
  AUTHOR;　
  
• 銅ターゲット均一利用のための回転型十字磁化プラズマスパッタリング装置の開発;　2016/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• RFマグネトロンスパッタにおけるPVDF薄膜特性に及ぼすガス圧力・電力の影響;　2016/12
  ANNOUNCEMENT INFO.;　, 20, 173-174
  AUTHOR;　
  
• Preparation of Copper Thin Film by Radio Frequency Magnetized Plasma Sputtering Source with Gyratory Various Magnet Arrangements;　2016/12
  ANNOUNCEMENT INFO.;　, C4-P20-010
  AUTHOR;　Y. Ohtsu , Md. Amzad Hossain, T. Ide and Y. Nakamura
  
• Electrical and Structural Properties of Copper Thin Films Deposited by Novel RF Magnetized Plasma Sputtering with Gyratory Square-Shaped Arrangement by Bar Permanent Magnets;　2016/10
  ANNOUNCEMENT INFO.;　69the Annual Gaseous Electronics Conference, October 10-14, 2016, Bulletin of the American Physical Society, 61, 9, 29, FT4-1
  AUTHOR;　Md. Amzad Hossain and Yasunori Ohtsu
  
• Spatial structure of plasma density and electron temperature in capacitive RF discharges with a single ring-shaped narrow trench of various depths;　2016/10
  ANNOUNCEMENT INFO.;　69th Annual Gaseous Electronics Conference, October 10-14, 2016, Bulletin of the American Physical Society, 61, 9, 46, HT6-60
  AUTHOR;　J. Schulze, E. Schuengel, N. Matsumoto, Y. Ohtsu
  
• RFマグネトロンスパッタリングにより合成したPVDF薄膜の評価;　2016/10
  ANNOUNCEMENT INFO.;　, pp.1-3, PST-16-075,PPT-16-055,ED-16-171　
  AUTHOR;　
  
• 角形磁石を用いた回転型十字磁化プラズマスパッタリング装置の開発と銅ターゲット均一利用;　2016/10
  ANNOUNCEMENT INFO.;　, pp.5-7, PST-16-076,PPT-16-056、ED-16-172
  AUTHOR;　
  
• 対向円筒型ターゲットを用いたRF磁化放電スパッタによるAZO透明導電薄膜合成;　2016/10
  ANNOUNCEMENT INFO.;　, pp.9-12, PST-16-077、PPT-16-057、ED-16-173
  AUTHOR;　
  
• Development of High-Density RF Magnetized Sputtering Plasma Source with Square-Shaped Arrangement of Magnets for Uniform Target Utilization;　2016/03
  ANNOUNCEMENT INFO.;　
  AUTHOR;　M. A. Hossain, K. Ikari , T. Ide, Y. Ohtsu
  
• Characteristics of Ring-Shaped Hollow Cathode Plasma with a Narrow Trench for High-density Capacitive Plasma Sources;　2015/09
  ANNOUNCEMENT INFO.;　The 10th Asian-European International Conference on Plasma Surface Engineering, Korea, P2-17, P2-17
  AUTHOR;　Yasunori Ohtsu, Naoki Matsumoto, Yuto Morita, Julian Schulze , Edmund Schuengel
  
• Plasma characteristics and target erosion profile of racetrack-shaped RF magnetron plasma with weak rubber magnets for full circular target utilization;　2015/09
  ANNOUNCEMENT INFO.;　, P2-18
  AUTHOR;　Yasunori Ohtsu, Shohei Tsuruta, Tatsuo Tabaru and Morito Akiyama
  
• Spatial structures of ring-shaped hollow cathode RF plasma with a single narrow trench for high-density plasma sources;　2015/09
  ANNOUNCEMENT INFO.;　The 76th JSAP Autumn meeting, 2015, Nagoya, 15p-PB2-45
  AUTHOR;　Yasunori Ohtsu, Naoki Matsumoto, Yuto Morita, Schulze Julian、Schuengel Edmund
  
• ターゲット有効利用のための様々な形状の磁化プラズマ生成と評価;　2015/03
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• リング状ホロー電極型高密度容量結合プラズマの溝深さの影響;　2015/03
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 機能性薄膜材料ターゲット有効利用のためのスパッタプラズマ装置の開発;　2015/01
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• リング状ホロー電極型容量結合プラズマの空間分布に及ぼす溝深さの影響;　2014/12
  ANNOUNCEMENT INFO.;　, 40, 124
  AUTHOR;　
  
• 材料ターゲット高効率利用のためのレーストラック型マグネトロンスパッタ装置の特性;　2014/12
  ANNOUNCEMENT INFO.;　, 40, 126
  AUTHOR;　
  
• ターゲット均一利用のための角形磁石を用いた十字型磁化プラズマの開発;　2014/12
  ANNOUNCEMENT INFO.;　, 18, 87-88
  AUTHOR;　
  
• ホロー電極と永久磁石を用いた低気圧高密度プラズマの空間分布計測;　2014/12
  ANNOUNCEMENT INFO.;　, 18, 89-90
  AUTHOR;　
  
• Spatial Profile of High-density Magnetized Capacitive Coupled Plasma with Ring-shaped Hollow Cathode;　2014/11
  ANNOUNCEMENT INFO.;　Proc. DPS2014 - 36th International Symposium on Dry Process, Nov. 27-28, P-36, pp89-90, Pacifico Yokohama (2014)., 89-90
  AUTHOR;　Y. Ohtsu, T. Yanagise
  
• 薄膜材料高効率利用のためのレーストラック型高周波プラズマスパッタ装置の特性;　2014/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• リング状ホロー電極を用いた容量結合型プラズマに及ぼす溝深さの影響;　2014/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 永久磁石を用いたリング状ホロー放電磁化プラズマ生成とその空間分布;　2014/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• PAPER AND PLASTIC-BASED WASTE NEUTRALIZATION USING MICROWAVE AND ELECTRIC ENERGY;　2014/07
  ANNOUNCEMENT INFO.;　
  AUTHOR;　Sebastian POPESCU and Yasunori OHTSU
  
• Production of RF magnetron plasma with arrangement of monopole magnets for target utilization improvement of transparent conductive oxide film deposition;　2014/03
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Characteristics of capacitively coupled collisional plasma with RF ring-shaped hollow electrode;　2014/02
  ANNOUNCEMENT INFO.;　8th International Conference on Reactive Plasmas / 31st Symposium on Plasma Processing（ICRP-8/SPP-31), Fukuoka, 6P-AM-S01-P05 (2014.2)
  AUTHOR;　Naoki Matsumoto and Yasunori Ohtsu
  
• Development of racetrack-shaped RF magnetron sputtering plasma with rubber magnet for target uniform utilization;　2014/02
  ANNOUNCEMENT INFO.;　8th International Conference on Reactive Plasmas / 31st Symposium on Plasma Processing（ICRP-8/SPP-31), Fukuoka, 6P-AM-S01-P04(2014.2)
  AUTHOR;　Shohei Tsuruta and Yasunori Ohtsu
  
• 機能性薄膜材料ターゲット有効利用のための磁化プラズマ装置の開発;　2014/02
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• レーストラック型磁石回転による高周波スパッタターゲット利用率の改善;　2013/12
  ANNOUNCEMENT INFO.;　, 39, 175
  AUTHOR;　
  
• シート状磁石を用いたマグネトロンプラズマに及ぼす磁石配置の影響;　2013/12
  ANNOUNCEMENT INFO.;　, 39, 177
  AUTHOR;　
  
• リング状ホロー電極を用いた容量結合型衝突プラズマの特性;　2013/12
  ANNOUNCEMENT INFO.;　, 39, 178
  AUTHOR;　
  
• シート状単極磁場配位を用いた均一スパッタ装置の開発;　2013/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 薄膜材料ターゲット高効率利用のための磁石回転型スパッタ装置の開発;　2013/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ホロー陰極効果による高速製膜用高密度容量結合型プラズマ装置の開発;　2013/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Production of High-Density RF Plasma Using Ring-Shaped Hollow Cathode for Material Processing;　2013/06
  ANNOUNCEMENT INFO.;　5th International Workshop on Plasma Scientech for All Something (PLASAS-5), June 21 – 23, 2013, Tokyo Institute of Technology, Japan
  AUTHOR;　Y.Ohtsu
  
• ライン状プラズマの生成とターゲット利用率改善;　2013/03
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• AlN薄膜高速合成のための磁石配置最適化によるRFマグネトロンプラズマ装置のターゲット利用率改善;　2013/01
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• アルゴン・水素混合ガスを用いた高周波リング状ホロー放電プラズマ特性;　2012/12
  ANNOUNCEMENT INFO.;　, 1-4
  AUTHOR;　
  
• 線状マグネトロンプラズマによるターゲット利用率の改善;　2012/12
  ANNOUNCEMENT INFO.;　, 118-118
  AUTHOR;　
  
• リング状ホロー電極と永久磁石を用いた低気圧RF高密度プラズマの生成;　2012/12
  ANNOUNCEMENT INFO.;　, 119-119
  AUTHOR;　
  
• 高密度プラズマ生成に及ぼすリング状ホロー電極溝形状の影響;　2012/12
  ANNOUNCEMENT INFO.;　, 121-121
  AUTHOR;　
  
• 単極磁場配位型マグネトロンプラズマに及ぼす磁石間距離の影響;　2012/12
  ANNOUNCEMENT INFO.;　, 123-123
  AUTHOR;　
  
• 高効率プラズマスパッタ薄膜合成装置開発におけるイオン密度分布計測;　2012/11
  ANNOUNCEMENT INFO.;　, 3-4
  AUTHOR;　
  
• ホロー効果を用いたプラズマプロセス装置におけるプラズマ密度のガス圧依存性;　2012/11
  ANNOUNCEMENT INFO.;　, 5-6
  AUTHOR;　
  
• 永久磁石とホロー電極を用いた低気圧プラズマ装置のプラズマ密度計測;　2012/10
  ANNOUNCEMENT INFO.;　, 1-2
  AUTHOR;　
  
• 高密度プラズマ生成に及ぼすホロー電極の溝形状の影響;　2012/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　武田賢治^M,大津康徳
  
• ターゲット利用率向上のための棒磁石を用いたライン状マグネトロンプラズマの生成;　2012/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　松本 祐樹^M，大津康徳
  
• ホロー電極を用いた低圧力高密度プラズマ源の開発に及ぼす永久磁石の影響;　2012/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　矢羽田　祥貴^M、大津康徳
  
• 単極磁場配位を用いた高周波マグネトロンプラズマの開発;　2012/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　青柳彰宏^M、大津康徳、三沢達也
  
• 単極磁場配位型RFマグネトロンスパッタによるターゲット利用率改善;　2012/05
  ANNOUNCEMENT INFO.;　, PST-12-003
  AUTHOR;　
  
• Wood Surface Treatment by Atmospheric RF Capacitively Coupled Plasma Jet;　2012/04
  ANNOUNCEMENT INFO.;　Proc. The 7th Asia-Pacific International Symposium on the Basics and Applications of Plasma Technology (APSPT-7), PL-07-01, 1-3
  AUTHOR;　Y.Ohtsu and M.Z.Hassan
  
• Numerical simulation of rf capacitive coupled plasma with ring-shaped hollow cathode;　2012/03
  ANNOUNCEMENT INFO.;　Abstract of The 2nd AICS International Symposium, Kobe, 2012.3.1-2, 12P, 62
  AUTHOR;　Yasunori Ohtsu
  
• 単極磁場配位によるRFマグネトロンスパッタのターゲット利用改善;　2012/03
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 外部磁石支援型マグネトロンスパッタリングによる窒化アルミニウム薄膜高速合成に関する研究;　2012/01
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 高周波リング状ホロー陰極放電プラズマ生成に及ぼす溝形状の影響;　2011/12
  ANNOUNCEMENT INFO.;　, 77-80
  AUTHOR;　
  
• ターゲット均一利用のための棒磁石を用いた、線状マグネトロンプラズマの生成;　2011/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ホロー電極と永久磁石を用いた低気圧高密度容量結合プラズマの空間分布測定;　2011/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ポリイミドフィルム親水化処理に及ぼす大気圧容量結合型プラズマジェットの処理位置の影響;　2011/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 高密度プラズマ生成のためのリングホロー電極溝形状の検討;　2011/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ターゲット均一浸食利用のための単極磁場配位による高周波マグネトロンスパッタの開発;　2011/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Ar/H2混合ガスを用いたリング状ホロー放電のプラズマ特性;　2011/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Influence of trench shape of ring-shaped hollow electrode on high-density capacitive coupled plasma;　2011/11
  ANNOUNCEMENT INFO.;　Proc. Plasma Conference 2011, Kanazawa, 22P027-O(2011.11.22)
  AUTHOR;　Y.Ohtsu, Y.Yahata, J.Kagami, Y.Kawashimo, T.Takeuchi, T.Misawa
  
• 水素リング状ホロー放電による高周波プラズマの高密度化;　2011/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• パルス変調大気圧容量結合型プラズマジェットを用いたポリイミドフィルムの親水化処理;　2011/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 単極磁場配位を用いたターゲット均一スパッタリング装置の開発;　2011/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 棒磁石の最適化によるマグネトロンプラズマのターゲット利用率の改善;　2011/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ホロー電極と永久磁石による低気圧高密度プラズマの開発;　2011/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 高密度プラズマ発生のための新しいリングホロー電極の開発;　2011/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 低電子温度プラズマＣＶＤによる撥水膜合成と 低電子温度プラズマＣＶＤによる撥水膜合成と 低電子温度プラズマＣＶＤによる撥水膜合成とその密着性改善;　2011/05
  ANNOUNCEMENT INFO.;　, 1-4
  AUTHOR;　
  
• 高周波プラズマによる機能性薄膜合成;　2011/03
  ANNOUNCEMENT INFO.;　, 21-24
  AUTHOR;　
  
• ハイブリッドプラズマスパッタリングによる窒化アルミニウム薄膜高速合成に関する研究;　2011/01
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 酸化物電極やホロー構造電極による容量結合プラズマの高密度化;　2010/12
  ANNOUNCEMENT INFO.;　電気学会プラズマ研究会資料　PST－10－084，PPT－10－104, 91-94
  AUTHOR;　
  
• 無水銀光源開発に関する容量結合プラズマに及ぼす電極材料の影響;　2010/12
  ANNOUNCEMENT INFO.;　, 55-56
  AUTHOR;　
  
• C2H2F2 を用いた低電子温度プラズマによる撥水性薄膜合成とその基板パルスバイアスの影響;　2010/12
  ANNOUNCEMENT INFO.;　, 57-58
  AUTHOR;　
  
• 単極磁場配位を用いた高周波磁化プラズマスパッタ源の開発;　2010/12
  ANNOUNCEMENT INFO.;　, 59-60
  AUTHOR;　
  
• 高周波スパッタリングによるAlN 薄膜合成;　2010/12
  ANNOUNCEMENT INFO.;　, 61-62
  AUTHOR;　
  
• パルス変調高周波大気圧プラズマジェットを用いたポリイミドフィルムの親水化処理;　2010/12
  ANNOUNCEMENT INFO.;　, 103-104
  AUTHOR;　
  
• 無水銀光源に関する誘電体電極を用いた高周波容量結合プラズマ特性;　2010/09
  ANNOUNCEMENT INFO.;　, 1-1
  AUTHOR;　
  
• マルチリング電極型大気圧高周波プラズマジェットのパルス変調効果と表面処理;　2010/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• C2H2F2/Ar低電子温度プラズマCVD法による撥水性薄膜合成に及ぼす基板バイアスの影響;　2010/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 誘導結合型プラズマスパッタリング法を用いた圧電性窒化アルミニウム薄膜合成;　2010/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 無水銀光源開発における容量結合プラズマ特性に及ぼす電極材料の影響;　2010/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 高周波プラズマスパッタリングに及ぼす永久磁石配位の影響;　2010/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 大気圧容量結合型プラズマジェットによるポリイミドフィルムの親水化;　2010/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• リング状ホロー放電による高周波プラズマの高密度化と空間分布の均一化;　2010/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• フッ化ビニリデンガスを用いた高周波プラズマＣＶＤによる撥水性薄膜合成;　2010/08
  ANNOUNCEMENT INFO.;　, PST10, 58, 51-54
  AUTHOR;　
  
• Production of high-density capacitive-discharge plasma with ring-shaped hollow cathode for thin film preparation;　2010/07
  ANNOUNCEMENT INFO.;　Abstract of First International Conference on Fundamentals and Industrial Applications of HIPIMS, Sheffield, UK, 38
  AUTHOR;　 Y. Ohtsu, H. Urasaki and T. Hotta
  
• リング状ホロー陰極効果による高密度高周波プラズマ生成;　2010/05
  ANNOUNCEMENT INFO.;　, PST-10, 009, 1-4
  AUTHOR;　
  
• リング状ホロー溝電極を用いた高密度容量結合型プラズマ生成;　2010/03
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• リンク゛電極を用いた大気圧容量結合放電プラズマジェット生成とその応用;　2010/03
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Production of High-Density Plasma with Plasma-Ring Discharge;　2010/02
  ANNOUNCEMENT INFO.;　Proc. 27th Symp. Plasma Processing, 129-130
  AUTHOR;　Yasunori Ohtsu, Hiroshi Urasaki, Tatsuya Misawa, Hiroharu Fujita
  
• Characteristics of RF Capacitively Coupled Plasma with High-Secondary-Electron-Emission Electrode Materials for Mercury-Free Lamp;　2010/02
  ANNOUNCEMENT INFO.;　Proc. 27th Symp. Plasma Processing, Yokohama, 131-132
  AUTHOR;　Kazutoshi Kabashima, Tatsuya Misawa, Yasunori Ohtsu
  
• Development of Frequency Plasma Sputtering Device for Preparation of High-Temperature Piezoelectric-Sensor Thin Films;　2010/02
  ANNOUNCEMENT INFO.;　Proc. 27th Symp. Plasma Processing, 193-194
  AUTHOR;　Shigenori Tanaka, Tatsuya Misawa, Yasunori Ohtsu, Morito Akiyama,
  
• Preparation of Water-Repellent Thin Film with Low-Electron-Temperature Plasma CVD Using Mixture Gases of C2H2F2 and Ar;　2010/02
  ANNOUNCEMENT INFO.;　Proc. 27th Symp. Plasma Processing, 195-196
  AUTHOR;　Kiyoharu Kihara, Yasunori Ohtsu, Tatsuya Misawa,
  
• 機能性薄膜高速合成を目指した高密度プラズマ装置の開発;　2010/01
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ICP支援低周波バイアススパッタリングによる窒化アルミニウム薄膜の高速合成に関する研究;　2010/01
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Development of high-density plasma source produced by capacitive discharge with ring-shaped hollow electrode for thin film preparation;　2009/12
  ANNOUNCEMENT INFO.;　Proc. The Sixth Asia-Pacific International Symposium on the Basic and Application of Plasma Technology, 71-72
  AUTHOR;　Yasunori Ohtsu, Hiroshi Urasaki(M2) and Tomohiro Hotta(B4)
  
• リング状ホロー放電による容量結合型プラズマの高密度化;　2009/12
  ANNOUNCEMENT INFO.;　, 9-10
  AUTHOR;　
  
• マルチリング電極を用いた大気圧容量結合型放電プラズマジェットの生成;　2009/12
  ANNOUNCEMENT INFO.;　, 110-111
  AUTHOR;　
  
• リング状ホロー溝電極を用いた高密度容量結合型プラズマの生成;　2009/11
  ANNOUNCEMENT INFO.;　, 19-22
  AUTHOR;　
  
• リング状ホロー電極を用いた容量結合型プラズマ生成に与える溝とガス圧の影響;　2009/11
  ANNOUNCEMENT INFO.;　, 78-78
  AUTHOR;　
  
• Preparation of Water-Repellent Thin Film with Inductive Plasma using C2H2F2/Ar gases and Investigation of Its Adhesion by Positively Pulse-Biasing;　2009/09
  ANNOUNCEMENT INFO.;　Abstract of 16th International Conference of Surface Modification of Materials by Ion Beams PC-56, 222-222
  AUTHOR;　Y.Ohtsu, N.Wada, T.Misawa and H.Fujita
  
• Production of Dual Frequency Sputtering Plasma for Preparation of Aluminum Nitride Thin Films;　2009/09
  ANNOUNCEMENT INFO.;　Abstract of 16th International Conference of Surface Modification of Materials by Ion Beams PC-57, 223-223
  AUTHOR;　Y.Ohtsu, K.Hino, T.Misawa, H.Fujita, M.Akiyama and K.Yukimura
  
• Development of high-density radio frequency plasma s ource with ring-shaped hollow electrode for dry processing;　2009/09
  ANNOUNCEMENT INFO.;　Proc. of 31 International Symposium on Dry process, 2-P25, 57-58
  AUTHOR;　Y.Ohtsu, H.Urasaki, T.Misawa and H.Fujita
  
• 無水銀光源のための容量結合プラズマ特性に及ぼす誘電体電極材料の影響;　2009/09
  ANNOUNCEMENT INFO.;　平成２１年度電気関係学会九州支部第62回連合大会講演論文集, 12-2A-01
  AUTHOR;　
  
• リング状ホロー電極を用いた容量結合型プラズマに及ぼす溝構造の影響;　2009/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• AlN薄膜合成のための二周波プラズマスパッタリング装置の構築;　2009/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 高密着撥水性薄膜合成のための低電子温度プラズマ装置の構築;　2009/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• リング状溝電極を用いた高密度容量結合型プラズマの生成とその空間分布の均一化;　2009/08
  ANNOUNCEMENT INFO.;　, 25-28
  AUTHOR;　
  
• リング状ホロー電極を用いた容量結合型プラズマの高密度化;　2009/06
  ANNOUNCEMENT INFO.;　, PST-09, 21, 41-45
  AUTHOR;　
  
• Production of low-pressure high-density RF plasma using ring-shaped hollow cathode electrode;　2009/02
  ANNOUNCEMENT INFO.;　Proc. of Plasma Science Symposium 2009/The 26th Symposium on Plasma Processing, P2-54,pp.316-317., 316-317
  AUTHOR;　H. Urasaki, T.Misawa, Y.Ohtsu and H.Fujita
  
• Production of Atmospheric Radio Frequency Plasma Source using Helical Coil;　2009/02
  ANNOUNCEMENT INFO.;　Proc. of Plasma Science Symposium 2009/The 26th Symposium on Plasma Processing,P2-56, pp.320-321., 320-321
  AUTHOR;　K.Kabashima, T.Misawa and Y.Ohtsu
  
• Production of Atmospheric Plasma Jet with Capacitively Coupled Discharge and its Application;　2009/02
  ANNOUNCEMENT INFO.;　Proc. of Plasma Science Symposium 2009/The 26th Symposium on Plasma Processing, P3-33, pp.480-481., 480-481
  AUTHOR;　S.Tanaka, T.Misawa and Y.Ohtsu
  
• 二周波プラズマスパッタリングによる窒化アルミニウム薄膜高速合成に関する研究;　2009/02
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Preparation of water-repellent thin film with C2H2F2/Ar plasma and investigation of its adhesion;　2009/01
  ANNOUNCEMENT INFO.;　Proc. of The 2nd International Conference on Plasma Nanotechnology and Science (IC-PLANTS), Nagoya, (2009.1), P-05
  AUTHOR;　K.Wada, T.Misawa, Y.Ohtsu and H.Fujita,
  
• Preparation of aluminum nitride thin film with dual frequency plasma sputtering;　2009/01
  ANNOUNCEMENT INFO.;　Proc. of The 2nd International Conference on Plasma Nanotechnology and Science (IC-PLANTS), Nagoya, (2009.1) P-13.
  AUTHOR;　K.Hino, T.Misawa, Y.Ohtsu, M.Akiyama and H.Fujita,
  
• Observation of dielectric barrier discharge at various Xe/Ne mixture gas ratios;　2009/01
  ANNOUNCEMENT INFO.;　Proc. of The 2nd International Conference on Plasma Nanotechnology and Science (IC-PLANTS), Nagoya, (2009.1) P-19.
  AUTHOR;　T.Yamamura, T.Misawa, Y.Ohtsu and H.Fujita,
  
• C2H2F2/Arプラズマを用いた撥水性薄膜合成;　2008/12
  ANNOUNCEMENT INFO.;　, 5-6
  AUTHOR;　
  
• Xe/Ne混合ガスを用いた誘電体バリヤ放電特性;　2008/12
  ANNOUNCEMENT INFO.;　, 129-130
  AUTHOR;　
  
• 二周波プラズマスパッタリング法を用いた窒化アルミニウム薄膜の高速合成;　2008/12
  ANNOUNCEMENT INFO.;　, 29-30
  AUTHOR;　
  
• リング状溝電極を用いた高密度高周波プラズマ生成とその空間構造;　2008/12
  ANNOUNCEMENT INFO.;　, 61-64
  AUTHOR;　
  
• リング状ホロー電極を用いた高密度高周波プラズマ生成;　2008/11
  ANNOUNCEMENT INFO.;　, 62-62
  AUTHOR;　
  
• DEVELOPMENT OF MICROWAVE REACTOR FOR PAPER-BASED WASTE NEUTRALIZATION;　2008/10
  ANNOUNCEMENT INFO.;　Proc. of The 5th Asian-Pacific Landfill Symposium in Sapporo, October 22-24, 2008, 4B-4, pp.1-6.(CD-ROM), 1-6
  AUTHOR;　Yasunori Ohtsu, Ryuzo Yamada, Hiroshi Urasaki, Tatsuya Misawa, Sebastian Popescu and Hiroharu Fujita
  
• リング状ホロー電極を用いた高密度高周波プラズマ源の開発;　2008/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 誘電体バリヤ放電開始電圧に及ぼすXe/Neガス混合比の影響;　2008/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• C_2H_2F_2を用いた低電子温度プラズマによる撥水性薄膜合成とその密着性の検討;　2008/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 二周波プラズマスパッタリングを用いた窒化アルミニウム薄膜の高速合成;　2008/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Two-dimensional spatial structure of inductively coupled plasma with one internal loop antenna;　2008/09
  ANNOUNCEMENT INFO.;　Abstract of 2008　International Conference on Plasma Physics, Fukuoka, Sept.8-12, ESP・P2-194(2008)p282., 282
  AUTHOR;　Y.Ohtsu, K.Aramaki and H.Fujita,
  
• High density capacitive plasma with multi-hollow cathode discharge and secondary electron emission;　2008/09
  ANNOUNCEMENT INFO.;　Abstract of 2008 International Conference on Plasma Physics, Fukuoka, Sept.8-12, ESP・P2-195(2008)p282., 282
  AUTHOR;　Y.Ohtsu, C.Nakamura, T.Misawa, H.Fujita, M.Akiyama,
  
• Preparation of transparent repellent films on plastic plate by low temperature RF plasma using C_2H_2H_2 gas;　2008/09
  ANNOUNCEMENT INFO.;　Abstracts of The Eleventh International Conference on Plasma Surface Engineering, PO2021, (2008)p316., 316
  AUTHOR;　Y.Ohtsu, N.Wada, T.Misawa and H.Fujita
  
• Inactivation of bacillus subtilis by atmospheric RF plasma for security and relief in life;　2008/09
  ANNOUNCEMENT INFO.;　Abstracts of The Eleventh International Conference on Plasma Surface Engineering, PO2075. (2008), p370., 370
  AUTHOR;　Y.Ohtsu, Y.Miyazaki and H.Fujita
  
• Production of high-density capacitively coupled plasma with RF multi-hollow cathode and/or high secondary electron emission;　2008/09
  ANNOUNCEMENT INFO.;　Abstracts of The Eleventh International Conference on Plasma Surface Engineering, PO4058 (2008), p549., 549
  AUTHOR;　Y.Ohtsu, C.Nakamura, T.Misawa, H.Fujita, M.Akiyama and K.Yukimura,
  
• 二周波プラズマスパッタリングによる窒化アルミニウム薄膜の高速合成～アルミニウム薄膜高速化～;　2008/07
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• C_2H_2F_2を用いたプラズマＣＶＤ法による撥水性薄膜合成とその密着性の検討;　2008/07
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 誘電体バリア放電に及ぼすXe/Ne混合ガス比の影響;　2008/07
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• マルチホロー陰極効果・高２次電子放出作用を用いた容量結合型高周波プラズマ生成;　2008/03
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Inactivation of bacillus subtilis by atmospheric barrier discharge plasma;　2008/01
  ANNOUNCEMENT INFO.;　Proc. of The 25th Symposium on Plasma Processing, Yamaguchi,
  AUTHOR;　Y.Ohtsu, Y.Miyazaki, T.Misawa and H.Fujita
  
• Production of high-density capacitively coupled plasma with multi-hollow cathode effect and preparation of a-C:H thin films;　2008/01
  ANNOUNCEMENT INFO.;　Proc.of The 25th Symposium on Plasma Processing, Yamaguchi
  AUTHOR;　Y.Ohtsu, C.Nakamura, T.Misawa, H.Fujita, M.Akiyama and K.Yukimura
  
• C_2H_2F_2を用いたプラズマＣＶＤ法による撥水性薄膜合成;　2007/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 誘電体バリア放電開始電圧に与えるＸｅ／Ｎｅガス混合比の影響;　2007/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Production of high-density capacitively discharge plasma with multi-hollow cathode for DLC coating;　2007/12
  ANNOUNCEMENT INFO.;　The 18th Symposium of the Materials Research Society of Japan, Tokyo,
  AUTHOR;　Y.Ohtsu, C.Nakamura, T.Misawa, H.Fujita, M.Akiyama and K.Yukimura
  
• プロセス用高周波・マイクロ波プラズマ源の開発とその応用;　2007/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• マイクロ波電力を用いた紙おむつの炭化処理;　2007/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ワンターン型アンテナ誘導結合型プラズマの空間構造解析;　2007/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• マルチホロー電極型高周波プラズマＣＶＤ法による炭素系薄膜の合成;　2007/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• マイクロ波による紙おむつの炭化処理;　2007/11
  ANNOUNCEMENT INFO.;　, 555-557
  AUTHOR;　
  
• マルチホロー陰極効果を用いた高密度容量結合型プラズマ生成と炭素系薄膜合成;　2007/11
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Production of dielectric barrier discharge microplasmas at various oxides with high secondary electron emission and high dielectric constan;　2007/10
  ANNOUNCEMENT INFO.;　 Abstract of The 4th International Workshop on Microplasmas, Taiwan, Oct. 28-31, FP-018, (2007)pp.57-58., 57-58
  AUTHOR;　Y.Ohtsu and H. Fujita
  
• 大気圧バリア放電によるポリマーシートの表面処理;　2007/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 誘電体バリヤ放電マイクロプラズマの放電開始電圧の低電圧化;　2007/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• C2H2F2を用いた低電子温度プラズマによる撥水性薄膜合成;　2007/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• マイクロ波電力を用いた紙おむつの無害化処理;　2007/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• マルチホロー電極型高周波プラズマCVD法による炭素系薄膜の成膜速度向上と均一化」;　2007/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ワンターン内部リングアンテナ型誘導結合プラズマの空間構造解析;　2007/09
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• High Deposition Preparation of Zirconia Films by Optimization of Geometry in Dual Frequency Sputtering for Protective Layer of Ceramics;　2007/09
  ANNOUNCEMENT INFO.;　9th International Workshop on Plasma-Based Ion Implantation & Deposition
  AUTHOR;　Y.Ohtsu, Y.Hino, H.Fujita, M.Akiyama and K.Yukimura
  
• Production of high-density RF plasma with multi hollow cathode discharge for DLC coating;　2007/09
  ANNOUNCEMENT INFO.;　9th International Workshop on Plasma-Based Ion Implantation & Deposition
  AUTHOR;　Y.Ohtsu, C.Nakamura, H.Fujita, M.Akiyama, T.Tabaru and K.Yukimura
  
• Preparation of water-repellent film by RF plasma CVD using C2H2F2 gas;　2007/09
  ANNOUNCEMENT INFO.;　Abstract of Sixth Asian-European International Conference on Plasma Surface Engineering (AEPSE2007), Nagasaki, Sept.24-29, (2007) P1004,p101., -101
  AUTHOR;　Y.Ohtsu, Y.Masuda, S.Yazaki, T.Misawa and H.Fujita,
  
• High-density plasma production by capacitively coupled discharge with multi-hollow cathode and secondary electron emission for DLC coating;　2007/09
  ANNOUNCEMENT INFO.;　Abstract of Sixth Asian-European International Conference on Plasma Surface Engineering (AEPSE2007), Nagasaki, Sept.24-29, (2007)P2009, p177., 177
  AUTHOR;　Y.Ohtsu, C.Nakamura, T.Misawa, H.Fujita. M.Akiyama, T.Tabaru and K.Yukimura
  
• Plasma characteristics of atmospheric microplasma produced by high secondary electron-emission-material;　2007/08
  ANNOUNCEMENT INFO.;　18th International Symposium on Plasma Chemistry
  AUTHOR;　Y. Ohtsu, N.Yamasaki and H.Fujita
  
• Inactivation characteristics of Bacillus Subtilis in low pressure pulsed plasma;　2007/08
  ANNOUNCEMENT INFO.;　18th International Symposium on Plasma Chemistry
  AUTHOR;　Dragos Vicoveanu, Yasunori Ohtsu, Hiroharu Fujita
  
• High density plasma production with effects of hollow-cathode and high secondary-electron-emission for a-C: H thin film preparation;　2007/08
  ANNOUNCEMENT INFO.;　18th International Symposium on Plasma Chemistry
  AUTHOR;　Y. Ohtsu, C.Nakamura, H.Fujita. M.Akiyama and T.Tabaru
  
• Nonlinear spatial profiles of plasma parameters in a magnetized inductive radio-frequency discharge;　2007/07
  ANNOUNCEMENT INFO.;　28th International Conference on Phenomena in Ionized Gases,
  AUTHOR;　S. Popescu*, Y. Ohtsu and H. Fujita
  
• Plasma production using one turn internal loop antenna by means of radio frequency discharge;　2007/07
  ANNOUNCEMENT INFO.;　28th International Conference on Phenomena in Ionized Gases,
  AUTHOR;　H.Fujita, K.Aramaki and Y.Ohtsu
  
• 高２次電子放出電極材料を用いた大気圧マイクロプラズマの放電特性;　2007/03
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ホロー陰極効果と２次電子放出効果による高密度RFプラズマ生成と炭素系薄膜合成;　2007/03
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Improvement in preparation of a-C:H thin films with RF plasma CVD by multi-hollow electrode;　2007/01
  ANNOUNCEMENT INFO.;　24th Symposium on Plasma Processing
  AUTHOR;　Y.Ohtsu, C.Nakamura, H.Fujita, M.Akiyama and T.Tabaru
  
• Influence of dielectric constant on atmospheric barrier discharge plasma using noble gas;　2007/01
  ANNOUNCEMENT INFO.;　24th Symposium on Plasma Processing
  AUTHOR;　Y.Ohtsu, N.Yamasaki and H.Fujita
  
• Spatial structure of RF plasma using an internal loop antenna;　2007/01
  ANNOUNCEMENT INFO.;　24th Symposium on Plasma Processing
  AUTHOR;　H.Fujita, K.Aramaki and Y.Ohtsu
  
• Formation of double layer in RF magnetized inductively coupled plasma with a helical antenna;　2007/01
  ANNOUNCEMENT INFO.;　24th Symposium on Plasma Processing
  AUTHOR;　H.Fujita, S.Popescu, A.Ishibashi and Y.Ohtsu
  
• マルチホロー陰極効果・高２次電子放出作用を用いた容量結合型高密度プラズマ生成;　2007
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Production of high-density capacitively coupled plasma with multi-hollow cathode effect and preparation of a-C:H thin films;　2007
  ANNOUNCEMENT INFO.;　Proc. of The 25th Symposium on Plasma Processing
  AUTHOR;　Y.Ohtsu, C.Nakamura, T.Misawa, H.Fujita, M.Akiyama and K.Yukimura
  
• Inactivation of bacillus subtilis by atmospheric barrier discharge plasma;　2007
  ANNOUNCEMENT INFO.;　Proc. of The 25th Symposium on Plasma Processing
  AUTHOR;　Y.Ohtsu, Y.Misazaki, T.Misawa and H.Fujita
  
• マルチホロー電極型高周波プラズマＣＶＤ法による炭素系薄膜の合成;　2007
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ワンターンリング型アンテナ誘導結合プラズマの空間構造解析;　2007
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• マイクロ波電力による紙おむつの炭化処理;　2007
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• プロセス用高周波・マイクロ波プラズマ源の開発とその応用;　2007
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Production of high-density capacitively discharge plasma with multi-hollow electrode for DLC coating;　2007
  ANNOUNCEMENT INFO.;　The 18th Symposium of The Materials Research Society of Japan,
  AUTHOR;　Y.Ohtsu, C. Nakamura, T.Misawa, H.Fujita, M.Akiyama, K.Yukimura,
  
• マルチホロー陰極効果を用いた高密度容量結合型プラズマ生成と炭素系薄膜合成;　2007
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• マイクロ波による紙おむつの炭化処理;　2007
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• PLASMA TREATMENT OF POLYMER MATERIAL BY DIELECTRIC BARRIER DISCHARGE WITH MESH ELECTRODE;　2007
  ANNOUNCEMENT INFO.;　The 4th International Workshop on Microplasmas
  AUTHOR;　Y. Ohtsu, K. Kawaguchi and H. Fujita
  
• PRODUCTION OF DIELECTRIC BARRIER DISCHARGE MICROPLASMAS AT VARIOUS OXIDES WITH HIGH SECONDARY ELECTRON EMISSION AND HIGH DIELECTRIC CONSTANT;　2007
  ANNOUNCEMENT INFO.;　The 4th International Workshop on Microplasmas
  AUTHOR;　Y.Ohtsu and H. Fujita
  
• High-density plasma production by capacitively coupled discharge with multi-hollow cathode and secondary electron emission for DLC coating;　2007
  ANNOUNCEMENT INFO.;　Sixth Asian-European International Conference on Plasma Surface Engineering
  AUTHOR;　Y.Ohtsu, C.Nakamura, T.Misawa, H.Fujita, M.Akiyama, T.Tabaru and K.Yukimura,
  
• Preparation of water-repellent film by RF plasma CVD using C2H2F2 gas;　2007
  ANNOUNCEMENT INFO.;　Sixth Asian-European International Conference on Plasma Surface Engineering
  AUTHOR;　Y.Ohtsu, Y.Masuda, S.Yazaki, T.Misawa and H.Fujita
  
• 誘導結合型プラズマスパッタリングによる窒化アルミニウム薄膜合成;　2007
  ANNOUNCEMENT INFO.;　
  AUTHOR;　樋野幸己、三沢達也**, 大津康徳**, 藤田寛治
  
• Sporicidal effects of oxygen plasma RF plasma;　2006/12
  ANNOUNCEMENT INFO.;　プラズマ・核融合学会九州・沖縄・山口支部　第10回支部大会
  AUTHOR;　D.Vicobeanu, Y.Ohtsu and H.Fujita
  
• Spatial structure and potential oscillation in magnetized ICP;　2006/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 大気圧バリア放電特性に及ぼす高２次電子放出・強誘電体電極材料の影響;　2006/11
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• エネルギーの異なるプラズマイオン交互注入による炭素系硬質薄膜合成;　2006/11
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 内部リングアンテナ型誘導結合型プラズマの空間構造解析;　2006/11
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ヘリカルアンテナ型誘導結合型磁化プラズマの空間分布測定;　2006/11
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• マルチホロー電極を用いた高周波プラズマＣＶＤ法による炭素系薄膜合成;　2006/11
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• マルチホロー電極型高周波プラズマＣＶＤによる炭素系薄膜合成の向上;　2006/11
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• プラズマプロセシングによる撥水性セラミックス薄膜合成;　2006/10
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Microplasma generation beyond atmospheric pressure by dielectric barrier discharge with high secondary-electron-emission oxides;　2006/10
  ANNOUNCEMENT INFO.;　13th Asian Conference on Electrical Discharge
  AUTHOR;　○ Y.Ohtsu, K.Eura and H.Fujita
  
• Preparation of diamond-like carbon thin films by alternative implantation of plasma ions with different energies;　2006/10
  ANNOUNCEMENT INFO.;　13th Asian Conference on Electrical Discharge
  AUTHOR;　Y.Ohtsu, C.Nakamura, H.Fujita, M.Akiyama and K.Yukimura
  
• Dynamic potential formation in magnetized inductively coupled plasma;　2006/10
  ANNOUNCEMENT INFO.;　13th Asian Conference on Electrical Discharge
  AUTHOR;　S. Popescu, A. Ishibashi, Y. Ohtsu and H. Fujita
  
• Bacillus spores sterilization using low temperature oxygen plasma;　2006/10
  ANNOUNCEMENT INFO.;　13th Asian Conference on Electrical Discharge
  AUTHOR;　 D.Vicoveanu（Ｄ２）, Y. Ohtsu, H.Fujita,
  
• 身近な家電・情報機器による電磁波体験型創造性育成教材;　2006/08
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Breakdown characteristics of atmospheric pressure microplasma produced by dielectric barrier discharge with high-secondary-electron-emission oxides;　2006/05
  ANNOUNCEMENT INFO.;　3rd International Workshop on Microplasmas 2006
  AUTHOR;　 Y.Ohtsu, K.Eura and H.Fujita
  
• 電子レンジによる創造性育成教材の開発;　2006/03
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 負極性高電圧パルス重畳型高周波プラズマの特性と炭素系薄膜合成;　2006/03
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Preparation of ultra-water-repellent films with pulse-modulated capacitively coupled RF plasma using C2H2F2-Ar mixture gases;　2006
  ANNOUNCEMENT INFO.;　6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing
  AUTHOR;　Y.Ohtsu, S.Yazaki and H.Fujita
  
• Influences of negatively pulse-modulated high-voltage biasing on RF plasma for diamond-like carbon thin film preparation;　2006
  ANNOUNCEMENT INFO.;　6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing
  AUTHOR;　Y.Ohtsu, C.Nakamura, H.Fujita, M.Akiyama and C.Diplasu
  
• Current-Free Double Layer Formation in a Magnetically Enhanced Inductively Coupled Plasma;　2006
  ANNOUNCEMENT INFO.;　6th International Conference on Reactive Plasmas and 23rd Symposium on Plasma Processing
  AUTHOR;　Sebastian Popescu, Ilarion Mihaila, Yasunori Ohtsu and Hiroharu Fujita
  
• Influnece of zirconium target state on ZrO2 thin film prepared by an inductively coupled RF plasma sputtering;　2005
  ANNOUNCEMENT INFO.;　Proc. of Plasma Science Symposium2005/The 22nd Symposium on Plasma Processing, AP051202, 389-390
  AUTHOR;　Y.Ohtsu, Y.Hino, T.Misawa, H.Fujita, K.Yukimura and M.Akiyama
  
• Preparation of water-repellent thin film using pulse-modulated RF plasma CVD;　2005
  ANNOUNCEMENT INFO.;　Proc. of Plasma Science Symposium2005/The 22nd Symposium on Plasma Processing, AP051202, 625-626
  AUTHOR;　Y.Ohtsu, S.Yazaki, T.Misawa and H.Fujita
  
• 反応性プラズマスパッタによるジルコニア薄膜合成に及ぼすイオン衝撃エネルギー効果;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 高周波プラズマＣＶＤ法による撥水性薄膜合成に与える基板バイアスの影響;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ＤＬＣ薄膜合成における容量結合型プラズマに及ぼす負極性高電圧パルスバイアスの効果;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 二周波プラズマスパッタリングによる銅イオン生成;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Influence of ion-bombardment-energy on thin zirconium oxide film prepared by dual frequency oxygen plasma sputtering;　2005
  ANNOUNCEMENT INFO.;　The 8th International Workshop on Plasma-Based Ion Implantation and Deposition, T3-10 2005.9.19
  AUTHOR;　Y.Ohtsu,Y.Hino,T.Misawa, H.Fujita, K.Yukimura and M.Akiyama
  
• Effect of negative pulsed high-voltage-bias on diamond-like carbon thin film preparation using capacitively coupled RF plasma CVD;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 二周波スパッタリングを用いた銅イオン源の開発;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 誘導結合型磁化プラズマの空間構造解析;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 酸化物誘電体バリア放電マイクロプラズマの放電開始電圧の低減;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• バリア放電方式オゾナイザの直列接続による高効率化;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 高周波スパッタリングを用いたNi薄膜の形成とカーボンナノチューブの合成;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• C2H2F2プラズマCVDを用いた超撥水性薄膜合成における外部パラメータ依存性;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• スパッタリング法を用いたZrO2薄膜合成における成膜速度の向上;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• メッシュ電極を用いた大気圧バリア放電プラズマの低温化とPET，PP表面改質基礎実;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• パルス高電圧バイアス型高周波プラズマＣＶＤによる機能性ＤＬＣ薄膜合成;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 均一磁界配位における誘導結合型磁化プラズマの空間構造解析;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 二周波スパッタリングを用いた銅イオン生成;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 負極性パルス高電圧バイアス型高周波プラズマＣＶＤによる機能性ダイヤモンド状薄膜合成;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Structural modifications of single-wall carbon nanotubes treated by oxygen plasma;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Potential formation in magnetized inductively coupled plasma;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 二周波プラズマスパッタリングを用いたZrO2薄膜合成に及ぼす酸素ガス濃度の影響;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• メッシュ電極を用いた大気圧バリア放電プラズマによる表面処理;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 誘電体バリア放電マイクロプラズマ生成に及ぼす酸化物電極材料の影響;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Ｃ２Ｈ２Ｆ２プラズマＣＶＤによる超撥水性薄膜合成に及ぼすＣ２Ｈ２Ｆ２ガス濃度及び流量の影響;　2005
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 陶磁器表面への高機能性酸化ジルコニウム薄膜合成;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Optimization of oxide electrode materials on high-density plasma production for capacitively coupled plasma;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Preparation of zirconium oxide thin film on surface of ceramics using inductively coupled plasma reactive sputtering;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• High concentration ozone generation with high dielectric materials using a barrier discharge;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Preparation of nanoparticles using rf plasma sputtering with two process modes;　2004
  ANNOUNCEMENT INFO.;　International workshop on plasma nano-technology and its future vision, P-14
  AUTHOR;　Y.Ohtsu, T.Goto, T.Imamura, K.Korenaga, T.Misawa and H.Fujita
  
• Optimization of oxide material electrode for high-density plasma production in capacitively coupled RF discharge;　2004
  ANNOUNCEMENT INFO.;　International Symposium on Novel Materials Processing by Advanced Electromagnetic Energy Sources, p35
  AUTHOR;　Y.Ohtsu, T.Shimazoe, T.Misawa and H.Fujita
  
• Influence of surface state of sputtering target on ZrO2 thin film preparation;　2004
  ANNOUNCEMENT INFO.;　International Symposium on Novel Materials Processing by Advanced Electromagnetic Energy Sources, p89
  AUTHOR;　Y.Ohtsu, M.Egami, T.Misawa, H.Fujita, K.Yukimura, M.Akiyama and T.Tahara
  
• C2H2F2ガスを用いた高周波プラズマＣＶＤ法による超撥水性薄膜合成;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 反応性プラズマスパッタリングによる酸化ジルコニウム薄膜合成;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Radio frequency plasma production with external helical antenna in a magnetic field;　2004
  ANNOUNCEMENT INFO.;　7th Asia Pacific Conference on Plasma Science and Technology, 17th Symposium on Plasma Science for Materials, 29P-94, pp.165
  AUTHOR;　I.Mihaila(D3), Y.Ohtsu and H.Fujita
  
• Preparation of ultra water-repellent thin films by radio frequency plasma CVD using C2H2F2 gas;　2004
  ANNOUNCEMENT INFO.;　7th Asia Pacific Conference on Plasma Science and Technology, 17th Symposium on Plasma Science for Materials, 30P-22, pp.262
  AUTHOR;　Y.Ohtsu, N.Yamagami, S.Yazaki, T.Misawa and H.Fujita
  
• Preparation of zirconium oxide thin film using reactive inductively coupled plasma sputtering;　2004
  ANNOUNCEMENT INFO.;　7th Asia Pacific Conference on Plasma Science and Technology, 17th Symposium on Plasma Science for Materials, 30P-23, p.263
  AUTHOR;　Y.Ohtsu, M.Egami, Y.Hino, T.Misawa, H.Fujita, K.Yukimura, M.Akiyama and T.Tabaru
  
• Optimum dielectric constant for high ozone generation with dielectric barrier discharge;　2004
  ANNOUNCEMENT INFO.;　7th Asia Pacific Conference on Plasma Science and Technology, 17th Symposium on Plasma Science for Materials, 01P-47, p401
  AUTHOR;　M.Toyofuku(D3), Y.Ohtsu and H.Fujita
  
• Influence of oxide material on high density plasma production using capacitively coupled discharge;　2004
  ANNOUNCEMENT INFO.;　7th Asia Pacific Conference on Plasma Science and Technology, 17th Symposium on Plasma Science for Materials, 01P-78, p.432
  AUTHOR;　Y.Ohtsu, T.Shimazoe, T.Misawa and H.Fujita
  
• Investigation of electron density on light emission in mercury-free electrode-less lamp using inductively coupled discharge;　2004
  ANNOUNCEMENT INFO.;　7th Asia Pacific Conference on Plasma Science and Technology, 17th Symposium on Plasma Science for Materials, 01P-110, p464
  AUTHOR;　H.Kashiwazaki, Y.Ohtsu and H.Fujita
  
• C2H2F2高周波プラズマＣＶＤ法による超撥水性薄膜合成と密着性向上;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• C2H2F2高周波プラズマＣＶＤ法による超撥水性薄膜合成;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 誘導結合型プラズマスパッタリングによる酸化ジルコニウム薄膜合成;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ナノパルス高電圧重畳による高周波プラズマ中の炭素系硬質薄膜合成;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 高周波誘導結合型プラズマ中のスパッタ超微粒子の粒径制御;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Influence of magnetic field configuration on plasma structure in an inductively discharge;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Preparation of zirconium oxide thin film using plasma sputtering for surface coating of ceramics;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• C2H2F2ガスを用いた高周波プラズマＣＶＤによる超撥水性薄膜合成とその密着性向上;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 酸素プラズマスパッタ法による酸化ジルコニウム薄膜合成に及ぼすターゲット状態の影響;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• プラズマＣＶＤを用いた超撥水性薄膜合成に与える基板バイアス電圧の影響;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 反応性プラズマスパッタリングを用いたＺｒＯ２薄膜合成に及ぼす基板入射イオンエネルギーの影響;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 酸化物誘電体バリア放電を用いた大気圧マイクロプラズマの放電開始電圧の低減 ギーの影響;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• バリア放電を用いた大気圧低温プラズマの生成;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ２周波反応性プラズマスパッタリングによるジルコニア薄膜合成に与えるイオン衝撃の効果;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• C2H2F2容量結合型プラズマＣＶＤ法で合成された撥水性薄膜の水滴接触角制御;　2004
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 強誘電体を用いたバリア放電によるオゾン生成高効率化;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ECRスパッタリングプラズマ中の基板入射イオンエネルギー分布;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 高gamma係数電極を用いた容量結合型放電による高密度プラズマ生成;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Instabilities in the Transition Region from CCP to ICP in Electronegative RF Plasma;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• High-Density Plasma Production with Capacitively Coupled RF Discharge Using High gamma Coefficient Material Electrodes;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Ozone Genration with High Dielectric Materials Barrier Discharge in a Parallelp-Plate System;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 誘導結合型プラズマスパッタリングによる酸化ジルコニウム薄膜合成;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 酸素誘導結合型プラズマを用いた酸化ジルコニウム薄膜合成;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 酸化ジルコニウム合成技術の最近の動向と反応性スパッタリング法による ＺｒＯ２薄膜合成ー非平衡プラズマと薄膜技術ー;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 容量結合型プラズマ特性に与える酸化物電極材質の影響;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 酸素誘導結合型プラズマスパッタリングによる酸化ジルコニウム薄膜合成;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Preparation of Zirconium Oxide Thin Film Using Inductively Coupled Oxygen Plasma Sputtering;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 誘導結合型プラズマスパッタリングを用いた酸化ジルコニウム薄膜の形成;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• MgO電極容量結合型プラズマの高密度化に及ぼす導入ガスの影響;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 低気圧磁化プラズマにおけるシース二次元構造;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 容量結合型プラズマの高密度化に対する電極材質の最適化;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 誘導結合型プラズマスパッタリングを用いた陶磁器表面への酸化ジルコニウム薄膜合成;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 酸素誘導結合型プラズマによる酸化ジルコニウム薄膜合成;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 容量結合型放電における高密度プラズマ生成に与える酸化物電極の影響;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• C2H2F2ガスを用いた高周波プラズマによる超撥水性薄膜の合成;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Zirconium Oxide Thin Film Preparation Using Oxygen Inductively Coupled Plasma Sputtering;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• High-Density Plasma Production in Capacitively Coupled RF Discharge by Means of Oxide Materials Electrodes;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 酸化物電極を用いた容量結合型放電プラズマの高密度化;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Energy Distribution Functions of Ions Impacting on DC and RF Biased Substrate in a NeW Type ECR Plasma using Ring Shaped Permanent Magnets;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• Development of Compact Ozonizer by Barrier Discharge for high concentration ozone generation;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ＭｇＯ電極を用いた容量結合型高周波放電に及ぼす導入ガスの影響;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 低ガス圧下での磁化プラズマにおけるイオンシースの二次元電位構造;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ナノパルス高電圧・高周波ハイブリッドプラズマによる炭素系薄膜合成;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  

Other Lectures

• 佐賀大学プラズマエレクトロニクス研究室の紹介;　2023/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 佐賀大学理工学部電気電子工学部門プラズマエレクトロニクス研究室紹介;　2022/12
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• リング状ホロー放電を用いた高密度高周波プラズマ源の開発;　2013/01
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 科学工作実験指導;　2011/08
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 科学工作実験指導;　2011/08
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 平成２２年度アバンセフェスタ、親子で科学「皆で電気を創って使おう」;　2010/08
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 紙おむつ・注射器の無害化処理;　2010/02
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ２００９年度リフレッシュ理科教室佐賀会場;　2009/08
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 神崎市内土曜日講座「児童・生徒科学実験教室」;　2009/05
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 紙おむつ・注射器の処理装置開発;　2009/02
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 神崎市小中学校理科主任研修会;　2008/08
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 神崎市内土曜日講座「児童・生徒科学実験教室」;　2008/05
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 電子レンジや人工雷発生器を使った出前実験;　2008/02
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 発電や発光ダイオードに関する出前授業;　2008/02
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 発光ダイオードを使った光実験;　2008/02
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 光電池や発光ダイオードを使った出前授業;　2007/11
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• ２００７年度リフレッシュ理科教室開催;　2007/08
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• プラズマと科学ープラズマテレビへの利用ー;　2007/06
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  

Application of Intellectual Property Rights

• プラズマ処理装置;　2016/11
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 臭素回収方法およびその装置;　2014/08
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• プラズマ処理装置;　2012/06
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 臭素回収方法およびその装置;　2012/05
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• プラズマ処理装置;　2011/06
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 臭素回収方法およびその装置;　2010/11
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• オゾン発生方法および装置;　2003
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  

Invited Lecture, Special Lecture

• Design of rotational RF magnetron sputtering plasma and its characteristics for target utilization saving resources;　2023/10
  ANNOUNCEMENT INFO.;　76th Annual Gaseous Electronics Conference, Bulletin of the American Physical Society (2023), Michigan,, HT1.1
  AUTHOR;　Yasunori Otsu, Md. Amzad Hossain, Julian Schulze
  
• Development of ring-shaped magnetized sputtering plasma source using two cylindrical facing targets and preparation of AZO thin films;　2023/01
  ANNOUNCEMENT INFO.;　, 37, 3, 1-10
  AUTHOR;　Yasunori Ohtsu
  
• Plasma fundamentals and its application for material processing;　2017/01
  ANNOUNCEMENT INFO.;　Special lecture in Rajshahi University of Engineering and Technology, Bangladesh, Jan. 26, 2017
  AUTHOR;　Md. Amzad Hossain and Yasunori Ohtsu
  
• Production of plasma sources by capacitively coupled discharge plasma(CCP) for functional thin film preparation;　2015/12
  ANNOUNCEMENT INFO.;　Special lecture on Plasma Physics and Technology, West Virginia University, USA
  AUTHOR;　Yasunori Ohtsu
  
• High-density RF plasma by hollow cathode for plasma processing;　2011/10
  ANNOUNCEMENT INFO.;　4st International Workshop on Plasma Scientech for All Something(Plasas-4),October 8-10,2011,Beijing,China
  AUTHOR;　Y.Ohtsu
  
• プラズマによる機能性薄膜合成～撥水性膜～;　2011/03
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• リフレッシュ理科教室（佐賀会場）の活動報告;　2007
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 佐賀での「リフレッシュ理科教室」ー７００人が参加する「体験型」理科教室ー;　2006
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 高周波スパッタによる炭素微粒子合成と成長過程;　2006
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 半導体プロセス関連企業技術ニーズ課題に対するコメント;　2005/06
  ANNOUNCEMENT INFO.;　
  AUTHOR;　
  
• 陶磁器表面への高機能性酸化ジルコニウム薄膜合成;　2004/06
  ANNOUNCEMENT INFO.;　
  AUTHOR;