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Effect of oxygen flow rate and temperature on Cu4O3 Thin Films by Radio Frequency Sputtering

発表形態:
一般講演(学術講演を含む)
主要業績:
その他
単著・共著:
共著
発表年月:
2018年12月
DOI:
会議属性:
国際会議(国内開催を含む)
査読:
無し
リンク情報:

日本語フィールド

著者:
Md Abdul Majed Patwary, Tooru Tanaka, Katsuhiko Saito, Qixin Guo, Kin Man Yu, and Wladek Walukiewicz
題名:
Effect of oxygen flow rate and temperature on Cu4O3 Thin Films by Radio Frequency Sputtering
発表情報:
The 3rd Asian Applied Physics Conference (Asian-APC), 8 December, 2018, Fukuoka, 8Po-6
キーワード:
概要:
抄録:

英語フィールド

Author:
Md Abdul Majed Patwary, Tooru Tanaka, Katsuhiko Saito, Qixin Guo, Kin Man Yu, and Wladek Walukiewicz
Title:
Effect of oxygen flow rate and temperature on Cu4O3 Thin Films by Radio Frequency Sputtering
Announcement information:
The 3rd Asian Applied Physics Conference (Asian-APC), 8 December, 2018, Fukuoka, 8Po-6


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