日本語フィールド
著者:K. Saito, T. Yamashita, T. Tanaka, M. Nishio,Q. Guo, and H. Ogawa題名:Growth of boron-doped ZnTe homoepitaxial layer by metalorganic vapor phase epitaxy発表情報:physica status solidi (c) 巻: 3 号: 4 ページ: 833-836キーワード:概要:抄録:英語フィールド
Author:K. Saito, T. Yamashita, T. Tanaka, M. Nishio,Q. Guo, and H. OgawaTitle:Growth of boron-doped ZnTe homoepitaxial layer by metalorganic vapor phase epitaxyAnnouncement information:physica status solidi (c) Vol: 3 Issue: 4 Page: 833-836