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Composition and Properties Control Growth of High-Quality GaOx Ny Film by One-Step Plasma-Enhanced Atomic Layer Deposition

著者：

Ma, H.-P., Li, X.-X., Yang, J.-H., Cheng, P., Huang, W., Zhu, J., Jen, T.-C., Guo, Q., Lu, H.-L., Zhang, D.W.

題名：

発表情報：

Chemistry of Materials, 31, 7405, 2019.

キーワード：

概要：

抄録：

Author：

Ma, H.-P., Li, X.-X., Yang, J.-H., Cheng, P., Huang, W., Zhu, J., Jen, T.-C., Guo, Q., Lu, H.-L., Zhang, D.W.

Title：

Composition and Properties Control Growth of High-Quality GaOx Ny Film by One-Step Plasma-Enhanced Atomic Layer Deposition

Announcement information:

Chemistry of Materials, 31, 7405, 2019.