日本語フィールド
著者:Q. Guo*, T. Nakao, T. Ushijima, K. Saito, T. Tanaka, M. Nishio題名:Growth of GaInN films on silicon substrates by reactive sputtering発表情報:The 12th International Symposium on Sputtering and Plasma Processes, Kyoto Research Park, July 10-12, 2013, TF P1-1.キーワード:概要:抄録:英語フィールド
Author:Q. Guo*, T. Nakao, T. Ushijima, K. Saito, T. Tanaka, M. NishioTitle:Growth of GaInN films on silicon substrates by reactive sputteringAnnouncement information:The 12th International Symposium on Sputtering and Plasma Processes, Kyoto Research Park, July 10-12, 2013, TF P1-1.