日本語フィールド
著者:Qixin Guo, Masahiko Ogata, Yaliu Ding, Tooru Tanaka, and Mitsuhiro Nishio題名:Heteroepitaxial growth of InN layers on (111) silicon substrates発表情報:Journal of Crystal Growth 311, 2783–2786, 2009.キーワード:概要:抄録:英語フィールド
Author:Qixin Guo, Masahiko Ogata, Yaliu Ding, Tooru Tanaka, and Mitsuhiro NishioTitle:Heteroepitaxial growth of InN layers on (111) silicon substratesAnnouncement information:Journal of Crystal Growth 311, 2783–2786, 2009.