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Characterization of damage in reactive ion etched ZnTe

著者：

Qixin Guo, Yuichi Matsumoto, Tooru Tanaka, Mituhiro Nishio, and Hiroshi Ogawa

題名：

発表情報：

Journal of Vacuum Science and Technology A21 ページ: 59-61

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概要：

抄録：

Author：

Qixin Guo, Yuichi Matsumoto, Tooru Tanaka, Mituhiro Nishio, and Hiroshi Ogawa

Title：

Characterization of damage in reactive ion etched ZnTe

Announcement information:

Journal of Vacuum Science and Technology A21 Page: 59-61