日本語フィールド
著者:Niloy Chandra Saha , Yuya Irie, Yuhei Seki, Yasushi Hoshino, Jyoji Nakata, Seong-Woo Kim , Toshiyuki Oishi, 読み: Niloy Chandra Saha , Yuya Irie, Yuhei Seki, Yasushi Hoshino, Jyoji Nakata, Seong-Woo Kim , Toshiyuki Oishi,題名:1651-V All-ion-implanted Schottky Barrier Diode on Heteroepitaxial Diamond with 3.6×105 On/off Ratio発表情報:IEEE Electron Dev. Lett. 巻: 44 ページ: 293キーワード:概要:1651-V All-ion-implanted Schottky Barrier Diode on Heteroepitaxial Diamond with 3.6×105 On/off Ratio抄録:1651-V All-ion-implanted Schottky Barrier Diode on Heteroepitaxial Diamond with 3.6×105 On/off Ratio英語フィールド
Author:Niloy Chandra Saha , Yuya Irie, Yuhei Seki, Yasushi Hoshino, Jyoji Nakata, Seong-Woo Kim , Toshiyuki Oishi,Title:1651-V All-ion-implanted Schottky Barrier Diode on Heteroepitaxial Diamond with 3.6×105 On/off RatioAnnouncement information:IEEE Electron Dev. Lett. Vol: 44 Page: 293An abstract:1651-V All-ion-implanted Schottky Barrier Diode on Heteroepitaxial Diamond with 3.6×105 On/off RatioAn abstract:1651-V All-ion-implanted Schottky Barrier Diode on Heteroepitaxial Diamond with 3.6×105 On/off Ratio