日本語フィールド
著者:N. C. Saha, Irie, Seki, Nakata, Hoshino, S. -W. Kim, T. Oishi, and M. Kasu, 読み: N. C. Saha, Irie, Seki, Nakata, Hoshino, S. -W. Kim, T. Oishi, and M. Kasu,題名:High On/Off Rectification Ratio of Diamond Schottky Barrier Diode Fabricated by All-Ion-Implantation Doping発表情報:32nd International Conference on Diamond and Carbon Materials (ICDCM2022), Marid, Sep 4-8, 2022キーワード:概要:High On/Off Rectification Ratio of Diamond Schottky Barrier Diode Fabricated by All-Ion-Implantation Doping抄録:High On/Off Rectification Ratio of Diamond Schottky Barrier Diode Fabricated by All-Ion-Implantation Doping英語フィールド
Author:N. C. Saha, Irie, Seki, Nakata, Hoshino, S. -W. Kim, T. Oishi, and M. Kasu,Title:High On/Off Rectification Ratio of Diamond Schottky Barrier Diode Fabricated by All-Ion-Implantation DopingAnnouncement information:32nd International Conference on Diamond and Carbon Materials (ICDCM2022), Marid, Sep 4-8, 2022An abstract:High On/Off Rectification Ratio of Diamond Schottky Barrier Diode Fabricated by All-Ion-Implantation DopingAn abstract:High On/Off Rectification Ratio of Diamond Schottky Barrier Diode Fabricated by All-Ion-Implantation Doping