日本語フィールド
著者:Y. Ohtsu, Y. Hino, T. Misawa, H. Fujita, K. Yukimura and M. Akiyama題名:Influence of ion-bombardment-energy on thin zirconium oxide films prepared by dual frequency oxygen plasma sputtering発表情報:Surf. Coat. Technol. 巻: 201 ページ: 6627-6630キーワード:概要:抄録:英語フィールド
Author:Y. Ohtsu, Y. Hino, T. Misawa, H. Fujita, K. Yukimura and M. AkiyamaTitle:Influence of ion-bombardment-energy on thin zirconium oxide films prepared by dual frequency oxygen plasma sputteringAnnouncement information:Surf. Coat. Technol. Vol: 201 Page: 6627-6630