日本語フィールド
著者:H.Sasaki, K.Kadoiwa, H.Koyama, Y.Kamo, Y.Yamamoto, T.Oishi, K.Hayashi題名:Decrease in on-state gate current of AlGaN/GaN HEMTs by recombination-enhanced defect reaction of generated hot carriers investigated by TCAD simulation発表情報:Microelectronic Engineering 巻: 54 ページ: pp.2662-2667キーワード:概要:抄録:英語フィールド
Author:H.Sasaki, K.Kadoiwa, H.Koyama, Y.Kamo, Y.Yamamoto, T.Oishi, K.HayashiTitle:Decrease in on-state gate current of AlGaN/GaN HEMTs by recombination-enhanced defect reaction of generated hot carriers investigated by TCAD simulationAnnouncement information:Microelectronic Engineering Vol: 54 Page: pp.2662-2667