日本語フィールド
著者:K.Shiozawa, T.Oishi, H.Maeda, T.Murakami, K.Yasumura, Y.Abe and Y.Tokuda題名:Electrical characteristics of ultra-fine trench isolation fabricated by a new two-step filling process発表情報:Extended Abstracts of the 1996 International Conference on Solid State Devices and Materials (SSDM1996), August 26-29, 1996, Yokohama, Japan, pp.419-421.キーワード:概要:抄録:英語フィールド
Author:K.Shiozawa, T.Oishi, H.Maeda, T.Murakami, K.Yasumura, Y.Abe and Y.TokudaTitle:Electrical characteristics of ultra-fine trench isolation fabricated by a new two-step filling processAnnouncement information:Extended Abstracts of the 1996 International Conference on Solid State Devices and Materials (SSDM1996), August 26-29, 1996, Yokohama, Japan, pp.419-421.