日本語フィールド
著者:N.Miura, T.Nanjo, M.Suita, T.Oishi, Y.Abe, T.Ozeki, H.Ishikawa, T.Egawa, T.Jinbo題名:Improvement of Schottky characteristics by insertion of refractory metal into Ni/Au electrode on n-(Al)GaN with thermal annealing発表情報:Electronic Materials Conference (EMC2003), June 25-27, 2003, Utah, T7.キーワード:概要:抄録:英語フィールド
Author:N.Miura, T.Nanjo, M.Suita, T.Oishi, Y.Abe, T.Ozeki, H.Ishikawa, T.Egawa, T.JinboTitle:Improvement of Schottky characteristics by insertion of refractory metal into Ni/Au electrode on n-(Al)GaN with thermal annealingAnnouncement information:Electronic Materials Conference (EMC2003), June 25-27, 2003, Utah, T7.