日本語フィールド
著者:T.Oishi, K.Shiozawa, A.Furukawa, Y.Abe and Y.Tokuda題名:Narrow-channel metal oxide semiconductor field effect transistor (MOSFET) isolated by an ultra-fine trench発表情報:Jpn. J. Appl. Phys. 36 (1997) pp.L547-L549.キーワード:概要:抄録:英語フィールド
Author:T.Oishi, K.Shiozawa, A.Furukawa, Y.Abe and Y.TokudaTitle:Narrow-channel metal oxide semiconductor field effect transistor (MOSFET) isolated by an ultra-fine trenchAnnouncement information:Jpn. J. Appl. Phys. 36 (1997) pp.L547-L549.