日本語フィールド
著者：S. Satoh, K. Yokogawa, M. Ishimine, S. Ihara and C. Yamabe題名：A study on mask type stereo-lithography with XeCl excimer laser発表情報：The review of Laser Engineering 巻: 26 ページ: 121-124キーワード：mask type stereo-lithography, XeCl excimer laser概要：抄録：英語フィールド
Author：S. Satoh, K. Yokogawa, M. Ishimine, S. Ihara and C. YamabeTitle：A study on mask type stereo-lithography with XeCl excimer laserAnnouncement information:The review of Laser Engineering Vol: 26 Page: 121-124Keyword：mask type stereo-lithography, XeCl excimer laser