日本語フィールド
著者：Yasunori Ohtsu, Chisa Nakamura, Tatsuya Misawa, Hiroharu Fujita, Morito Akiyama and Ken Yukimura題名：Production of high-density capacitively coupled plasma with RF multi-hollow cathode and/or high secondary electron emission for DLC film preparation発表情報：Plasma Process and Polymer 巻: 6 号: S1 ページ: S458-S461キーワード：概要：抄録：The effects of a hollow cathode discharge and secondary electron emission from a radiofrequency-biased electrode on the growing rate of diamond-like carbon films were studied.The rate of deposition for amorphous hydrogenous carbon thin films of about 200 nm/min was attained at a voltage of -700 V with radio-frequency plasma using CH4 gas. Because of its non-uniformity, the profile was improved by changing the hole arrangement. A radial roughness of the deposited films of about 35 nm, for a film thickness of about 1 micron, was obtained with the best arrangement.英語フィールド
Author：Yasunori Ohtsu, Chisa Nakamura, Tatsuya Misawa, Hiroharu Fujita, Morito Akiyama and Ken YukimuraTitle：Production of high-density capacitively coupled plasma with RF multi-hollow cathode and/or high secondary electron emission for DLC film preparationAnnouncement information:Plasma Process and Polymer Vol: 6 Issue: S1 Page: S458-S461An abstract：The effects of a hollow cathode discharge and secondary electron emission from a radiofrequency-biased electrode on the growing rate of diamond-like carbon films were studied.The rate of deposition for amorphous hydrogenous carbon thin films of about 200 nm/min was attained at a voltage of -700 V with radio-frequency plasma using CH4 gas. Because of its non-uniformity, the profile was improved by changing the hole arrangement. A radial roughness of the deposited films of about 35 nm, for a film thickness of about 1 micron, was obtained with the best arrangement.