日本語フィールド
著者:Y.Ohtsu, H.Noda, C.Nakamura, H.Fujita, K.Yukimura, M.Akiyama and C.Diplasu題名:Effect of negative pulsed high-voltage-bias on diamond-like carbon thin film preparation using capacitively coupled radio frequency plasma chemical vapor deposition発表情報:Surf. Coat. Tehcnol. 巻: 201 ページ: 6674-6677キーワード:概要:抄録:英語フィールド
Author:Y.Ohtsu, H.Noda, C.Nakamura, H.Fujita, K.Yukimura, M.Akiyama and C.DiplasuTitle:Effect of negative pulsed high-voltage-bias on diamond-like carbon thin film preparation using capacitively coupled radio frequency plasma chemical vapor depositionAnnouncement information:Surf. Coat. Tehcnol. Vol: 201 Page: 6674-6677