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著者:Ohtsu, Y / Yoshinaga, K / Fujita, H題名:Time-Averaged Energy Distribution Function of Ions Impacted on an RF-biased Substrate in Electron Cyclotron Resonance Microwave Plasma発表情報:JAPANESE JOURNAL OF APPLIED PHYSICS PART 1 REGULAR PAPERS SHORT NOTES AND REVIEW PAPERS 巻: 42 号: 12 ページ: 7552-7556キーワード:概要:抄録:英語フィールド
Author:Ohtsu, Y / Yoshinaga, K / Fujita, HTitle:Time-Averaged Energy Distribution Function of Ions Impacted on an RF-biased Substrate in Electron Cyclotron Resonance Microwave PlasmaAnnouncement information:JAPANESE JOURNAL OF APPLIED PHYSICS PART 1 REGULAR PAPERS SHORT NOTES AND REVIEW PAPERS Vol: 42 Issue: 12 Page: 7552-7556