日本語フィールド
著者:Y.Ohtsu and H.Fujita題名:Influences of gap distance on plasma characteristics in narrow gap capacitively coupled radio-frequency discharge発表情報:Jpn.J.Appl.Phys., 巻: 43 号: 2 ページ: 795-799キーワード:概要:抄録:英語フィールド
Author:Y.Ohtsu and H.FujitaTitle:Influences of gap distance on plasma characteristics in narrow gap capacitively coupled radio-frequency dischargeAnnouncement information:Jpn.J.Appl.Phys., Vol: 43 Issue: 2 Page: 795-799