日本語フィールド
著者:Qixin Guo, Masahiko Ogata, Yaliu Ding, Tooru Tanaka, Mitsuhiro Nishio題名:Heteroepitaxial growth of InN layers on (111) silicon substrates発表情報:Journal of Crystal Growth, 巻: 311 ページ: 2783-2786キーワード:概要:抄録:英語フィールド
Author:Qixin Guo, Masahiko Ogata, Yaliu Ding, Tooru Tanaka, Mitsuhiro NishioTitle:Heteroepitaxial growth of InN layers on (111) silicon substratesAnnouncement information:Journal of Crystal Growth, Vol: 311 Page: 2783-2786