日本語フィールド
著者:Tooru Tanaka, Kazuki Hayashida, Mitsuhiro Nishio, Yong Chang, Jun Wang, Shanli Wang, Qixin Guo, Hiroshi Ogawa題名:Effect of Gas Flow Rate on Properties of ZnTe Epitaxial Layers Grown by Horizontal Metalorganic Vapor Phase Epitaxy発表情報:13th International Conference on Crystal Growth (ICCG13), Kyoto, July 30-August 4, 2001キーワード:概要:抄録:英語フィールド
Author:Tooru Tanaka, Kazuki Hayashida, Mitsuhiro Nishio, Yong Chang, Jun Wang, Shanli Wang, Qixin Guo, Hiroshi OgawaTitle:Effect of Gas Flow Rate on Properties of ZnTe Epitaxial Layers Grown by Horizontal Metalorganic Vapor Phase EpitaxyAnnouncement information:13th International Conference on Crystal Growth (ICCG13), Kyoto, July 30-August 4, 2001