日本語フィールド
著者:Katsuhiko Saito, Tetsuo Yamashita, Tooru Tanaka, Mitsuhiro Nishio, Qixin Guo, and Hiroshi Ogawa題名:Growth of Boron-Doped ZnTe Homoepitaxial Layer by Metalorganic Vapor Phase Epitaxy発表情報:physica status solidi (c) 巻: 3 ページ: 833-836キーワード:概要:抄録:英語フィールド
Author:Katsuhiko Saito, Tetsuo Yamashita, Tooru Tanaka, Mitsuhiro Nishio, Qixin Guo, and Hiroshi OgawaTitle:Growth of Boron-Doped ZnTe Homoepitaxial Layer by Metalorganic Vapor Phase EpitaxyAnnouncement information:physica status solidi (c) Vol: 3 Page: 833-836